@inproceedings{CTT100658533,
  author = {Eisuke Tokumitsu and Isahaya Yamamura and Shiro Hino and Naruhisa Miura and Masayuki Imaizumi and Hiroaki Sumitani and Tatsuo Oomori},
  title = {Comparative Study of Metalorganic Chemical Vapour Deposition of HfO2 and Al2O3 Gate Insulators on SiC for Power MOSFET Applications},
  booktitle = {},
  year = 2012,
}

@inproceedings{CTT100632296,
  author = {山村勇速 and 徳光永輔 and 日野史郎 and 三浦 成久 and 大森 達夫},
  title = {MOCVD法によるSiC上へのHfO2膜の堆積とHfO2/SiO2/4H-SiC MOSFETの作製},
  booktitle = {},
  year = 2011,
}