@article{CTT100833073,
author = {Yoshiro Kumagai and Satoshi Fukuyama and Hiroki Tonegawa and Kizashi Mikami and Kodai Hirose and Kanta Tomizawa and Kensuke Ichikawa and Masahiro Watanabe},
title = {Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process},
journal = {Japanese Journal of Applied Physics},
year = 2020,
}
@inproceedings{CTT100833053,
author = {佐藤 穂波 and 熊谷 佳郎 and 三上 萌 and 利根川 啓希 and 廣瀬 皓大 and 冨澤 勘太 and 金子 拓海 and 渡辺 正裕},
title = {Si/CaF2 p型三重障壁共鳴トンネルダイオードの室温微分負性抵抗特性},
booktitle = {},
year = 2020,
}
@inproceedings{CTT100833054,
author = {金子 拓海 and 熊谷 佳郎 and 廣瀬 皓大 and 利根川啓希 and 三上 萌 and 冨澤 勘太 and 佐藤穂波 and 渡辺正裕},
title = {CaF2/Si/CaF2共鳴トンネル量子井戸構造を用いた抵抗スイッチング特性の理論解析},
booktitle = {},
year = 2020,
}
@inproceedings{CTT100833064,
author = {Yoshiro Kumagai and Satoshi Fukuyama and Hiroki Tonegawa and Kizashi Mikami and Kodai Hirose and Kanta Tomizawa and Keisuke Ichikawa and Masahiro Watanabe},
title = {Negative Differential Resistance in CaF2/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process},
booktitle = {},
year = 2019,
}
@inproceedings{CTT100833049,
author = {冨澤 勘太 and 熊谷 佳郎 and 利根川 啓希 and 三上 萌 and 廣瀬 皓大 and 金子 拓海 and 佐藤 穂波 and 渡辺 正裕},
title = {CaF2/Si/SiO2二重障壁共鳴トンネルダイオードの室温微分負性抵抗特性},
booktitle = {},
year = 2019,
}
@inproceedings{CTT100833048,
author = {利根川 啓希 and 熊谷 佳郎 and 三上 萌 and 廣瀬 皓大 and 冨澤 勘太 and 金子 拓海 and 佐藤 穂波 and 渡辺 正裕},
title = {Si/CaF2三重障壁共鳴トンネルダイオードの高ピーク電流密度を有する室温微分負性抵抗特性},
booktitle = {},
year = 2019,
}
@inproceedings{CTT100833050,
author = {三上 萌 and 熊谷 佳郎 and 廣瀬 皓大 and 冨澤 勘太 and 利根川 啓希 and 金子 拓海 and 佐藤 穂波 and 渡辺 正裕},
title = {原子層薄膜CaF2/Siヘテロ構造を用いたホール駆動共鳴トンネルダイオードの室温微分負性抵抗特性},
booktitle = {},
year = 2019,
}
@inproceedings{CTT100833051,
author = {廣瀬 皓大 and 熊谷 佳郎 and 利根川 啓希 and 冨澤 勘太 and 金子 拓海 and 佐藤 穂波 and 渡辺 正裕},
title = {Si/CaF2バイポーラ二重障壁共鳴トンネルダイオードの室温微分負性抵抗特性},
booktitle = {},
year = 2019,
}
@inproceedings{CTT100833047,
author = {市川研佑 and 利根川啓希 and 廣瀬皓大 and 三上萌 and 福山聡史 and 熊谷佳郎 and 渡辺正裕},
title = {金属をエミッタとするシリコン/フッ化物多重障壁共鳴トンネルダイオードの理論解析},
booktitle = {},
year = 2019,
}
@inproceedings{CTT100773666,
author = {廣瀬皓大 and 福山聡史 and 熊谷佳郎 and 利根川啓希 and 渡辺正裕},
title = {Si/CaF2二重障壁共鳴トンネルダイオードの室温微分負性抵抗特性},
booktitle = {},
year = 2018,
}
@inproceedings{CTT100773642,
author = {Hiroki Tonegawa and Yoshiro Kumagai and Satoshi Fukuyama and Koudai Hirose and MASAHIRO WATANABE},
title = {Room Temperature High Peak-to-valley Current Ratio of CaF2/Si Triple-barrier Resonant-tunneling Diode Grown on Si},
booktitle = {},
year = 2018,
}
@inproceedings{CTT100773660,
author = {熊谷佳郎 and 大野綜一郎 and 廣瀬皓大 and 福山聡史 and 利根川啓希 and 渡辺正裕},
title = {ドライエッチングプロセスによるCaF2/Si/CaF2共鳴トンネル構造の室温微分負性抵抗特性},
booktitle = {},
year = 2018,
}
@inproceedings{CTT100773658,
author = {利根川啓希 and 渡辺正裕},
title = {Si/CaF2三重障壁共鳴トンネルダイオードの室温微分負性抵抗特性},
booktitle = {},
year = 2018,
}