@article{CTT100939706,
  author = {Ryota Uehara and Shinsuke Maekawa and Takehiro Seshimo and Sugawara Ryutaro and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA},
  journal = {Journal of Photopolymer Science and Technology},
  year = 2025,
}

@article{CTT100929192,
  author = {Shinsuke Maekawa and Lander Verstraete and Hyo Seon Suh and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {High-Fidelity Directed Self-Assembly Using Higher-chi Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features},
  journal = {Advanced Functional Materials},
  year = 2025,
}

@article{CTT100928723,
  author = {Riku Mizusaki and Shinsuke Maekawa and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama-Sato and Yuta Nabae and Teruaki Hayakawa},
  title = {Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella},
  journal = {RSC Applied Interfaces},
  year = 2024,
}

@article{CTT100917451,
  author = {Shinsuke Maekawa and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly},
  journal = {Nature Communications},
  year = 2024,
}

@misc{CTT100929762,
  author = {前川伸祐},
  title = {次世代半導体微細加工に向けた強偏析性PS-b-PMMA誘導体の開発に関する研究},
  year = 2025,
}

@misc{CTT100929765,
  author = {前川伸祐},
  title = {次世代半導体微細加工に向けた強偏析性PS-b-PMMA誘導体の開発に関する研究},
  year = 2025,
}

@misc{CTT100929767,
  author = {前川伸祐},
  title = {次世代半導体微細加工に向けた強偏析性PS-b-PMMA誘導体の開発に関する研究},
  year = 2025,
}

@misc{CTT100929891,
  author = {早川晃鏡 and 前川伸祐 and 上原綾太 and 瀬下　武広 and 宮城　賢 and 太宰　尚宏},
  title = {エッチングマスクパターン形成用樹脂組成物、及びエッチングマスクパターンの製造方法},
  howpublished = {公開特許},
  year = 2024,
  month  = {},
  note   = {特願2024-066934(2024/04/17), 特開2024-160688(2024/11/14)}
}


@misc{CTT100929888,
  author = {早川晃鏡 and 前川伸祐 and 上原綾太 and 瀬下　武広　 and 太宰　尚宏　},
  title = {エッチングマスクパターンの製造方法及びエッチングマスクパターン形成用樹脂組成物},
  howpublished = {公開特許},
  year = 2024,
  month  = {},
  note   = {特願2024-067050(2024/04/17), 特開2024-159590(2024/11/08)}
}


@misc{CTT100932491,
  author = {早川晃鏡 and 前川伸祐 and 水嵜陸 and 上原　卓也 and 太宰　尚宏　},
  title = {ブロックコポリマー、下地剤、相分離構造形成用組成物成用樹脂組成物、
及び相分離構造を含む構造体の製造方法},
  howpublished = {公開特許},
  year = 2025,
  month  = {},
  note   = {特願2023-102848(2023/06/22), 特開2025-002574(2025/01/09)}
}


@misc{CTT100932495,
  author = {早川晃鏡 and 前川伸祐 and 水嵜陸 and 上原　卓也 and 太宰　尚宏},
  title = {相分離構造を含む構造体の製造方法、及び組成物},
  howpublished = {公開特許},
  year = 2025,
  month  = {},
  note   = {特願2023-102849(2023/06/22), 特開2025-002575(2025/01/09)}
}


@misc{CTT100929890,
  author = {早川晃鏡 and 前川伸祐 and 上原綾太 and 瀬下　武広　 and 太宰　尚宏},
  title = {エッチングマスクパターン形成用樹脂組成物、及びエッチングマスクパターンの製造方法},
  howpublished = {公開特許},
  year = 2024,
  month  = {},
  note   = {特願2023-073814(2023/04/27), 特開2024-158543(2024/11/08)}
}




@phdthesis{CTT100929762,
  author = {前川伸祐},
  title = {次世代半導体微細加工に向けた強偏析性PS-b-PMMA誘導体の開発に関する研究},
  school = {東京工業大学},
  year = 2025,
}

@phdthesis{CTT100929765,
  author = {前川伸祐},
  title = {次世代半導体微細加工に向けた強偏析性PS-b-PMMA誘導体の開発に関する研究},
  school = {東京工業大学},
  year = 2025,
}

@phdthesis{CTT100929767,
  author = {前川伸祐},
  title = {次世代半導体微細加工に向けた強偏析性PS-b-PMMA誘導体の開発に関する研究},
  school = {東京工業大学},
  year = 2025,
}