@article{CTT100917451,
  author = {Shinsuke Maekawa and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly},
  journal = {Nature Communications},
  year = 2024,
}

@article{CTT100816095,
  author = {Lei Dong and Rin Odashima and Takehiro Seshimo and Yuta Nabae and Teruaki Hayakawa},
  title = {Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers},
  journal = {Journal of Photopolymer Science and Technology},
  year = 2019,
}

@misc{CTT100701657,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}

@misc{CTT100701660,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}

@misc{CTT100701661,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}

@misc{CTT100708742,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}



@phdthesis{CTT100701657,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100701660,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100701661,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100708742,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}