@article{CTT100939708,
  author = {Hsi-Chih Wang and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {Development of PS-PMMA Block Copolymers Incorporating Poly(<i>n</i>-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment},
  journal = {Journal of Photopolymer Science and Technology},
  year = 2025,
}

@article{CTT100939706,
  author = {Ryota Uehara and Shinsuke Maekawa and Takehiro Seshimo and Sugawara Ryutaro and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA},
  journal = {Journal of Photopolymer Science and Technology},
  year = 2025,
}

@article{CTT100929192,
  author = {Shinsuke Maekawa and Lander Verstraete and Hyo Seon Suh and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {High-Fidelity Directed Self-Assembly Using Higher-chi Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features},
  journal = {Advanced Functional Materials},
  year = 2025,
}

@article{CTT100928723,
  author = {Riku Mizusaki and Shinsuke Maekawa and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama-Sato and Yuta Nabae and Teruaki Hayakawa},
  title = {Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella},
  journal = {RSC Applied Interfaces},
  year = 2024,
}

@article{CTT100917451,
  author = {Shinsuke Maekawa and Takehiro Seshimo and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly},
  journal = {Nature Communications},
  year = 2024,
}

@article{CTT100816095,
  author = {Lei Dong and Rin Odashima and Takehiro Seshimo and Yuta Nabae and Teruaki Hayakawa},
  title = {Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers},
  journal = {Journal of Photopolymer Science and Technology},
  year = 2019,
}

@misc{CTT100701657,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}

@misc{CTT100708742,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}

@misc{CTT100701661,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}

@misc{CTT100701660,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  year = 2016,
}



@phdthesis{CTT100701657,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100708742,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100701661,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100701660,
  author = {Takehiro Seshimo},
  title = {Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography},
  school = {東京工業大学},
  year = 2016,
}