@article{CTT100625875,
  author = {Tomohito Ogura and tomoya higashihara and mitsuru ueda},
  title = {Pattern formation of polyimide by using photosensitive polybenzoxazole as a top layer},
  journal = {European Polymer Journal},
  year = 2010,
}

@article{CTT100625874,
  author = {Tomohito Ogura and tomoya higashihara and mitsuru ueda},
  title = {Development of Photosensitive Poly(hydroximide) with high refractive index},
  journal = {J. Photopolym. Sci.＆Technol.},
  year = 2010,
}

@article{CTT100625873,
  author = {Masaya Sugiyama and Tomohito Ogura and tomoya higashihara and mitsuru ueda},
  title = {Development of a Chemically Amplified Photosensitive Polyimide Based on Poly(amic acid), a Dosslution Inhibitor, and a Photoacid Generator},
  journal = {J. Photopolym. Sci.＆Technol.},
  year = 2010,
}

@article{CTT100625860,
  author = {Yu Nakagawa and Tomohito Ogura and tomoya higashihara and mitsuru ueda},
  title = {Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index},
  journal = {},
  year = 2010,
}

@article{CTT100625854,
  author = {Tomohito Ogura and tomoya higashihara and mitsuru ueda},
  title = {Low-CTE photosensitive polyimide based on semialicyclic poly(amic acid) and photobase generator.},
  journal = {J. Polym. Sci. Part-A, Polym. Chem.},
  year = 2010,
}

@article{CTT100609525,
  author = {Keita Endo and Tomohito Ogura and T. Higashihara and mitsuru ueda},
  title = {A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator},
  journal = {Polym. J.},
  year = 2009,
}

@article{CTT100609519,
  author = {Tomohito Ogura and ; Tomoya Higashihara and mitsuru ueda},
  title = {Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator},
  journal = {},
  year = 2009,
}

@article{CTT100581853,
  author = {Tomohito Ogura and Tomoya Higashihara and Mitsuru Ueda},
  title = {Direct patterning of poly(amic acid) and low-temperature imidization using a crosslinker, a photoacid generator, and a thermobase generator},
  journal = {J. Polym. Sci., Part A: Polym. Chem.},
  year = 2009,
}

@article{CTT100555476,
  author = {Jin-gang LIU and Yasuhiro NAKAMURA and Tomohito OGURA and Yuji SHIBASAKI and Shinji ANDO and mitsuru ueda},
  title = {Optically Transparent Sulfur-Containing Polyimide-TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)-TiO2 Nanocomposite Film},
  journal = {Chemistry of Materials},
  year = 2008,
}

@article{CTT100576997,
  author = {tomohito ogura and katsuhisa mizoguchi and mitsuru ueda},
  title = {Development of Negative-type Photosensitive Polyimide, Based on Poly(amic acid)s, Photobase Generator, and Thermal Base Generator},
  journal = {J. Photopolym. Sci.＆Technol.},
  year = 2008,
}

@inproceedings{CTT100632952,
  author = {Yu Nakagawa and Tomohito Ogura and Tomoya Higashihara and Mitsuru Ueda},
  title = {Optically transparent sulfur-containing semi-alicyclic polyimide with high refractive index},
  booktitle = {240th ACS National Meeting, Preprint},
  year = 2010,
}

@inproceedings{CTT100589019,
  author = {Tomohito Ogura and Tomoya Higashihara and Mitsuru Ueda},
  title = {Synthesis of dissolution inhibitor for photosensitive polybenzoxazole},
  booktitle = {},
  year = 2009,
}

@misc{CTT100725660,
  author = {Tomohito Ogura},
  title = {Development of photosensitive polyimide and polybenzoxazole},
  year = 2010,
}



@phdthesis{CTT100725660,
  author = {Tomohito Ogura},
  title = {Development of photosensitive polyimide and polybenzoxazole},
  school = {東京工業大学},
  year = 2010,
}