@article{CTT100507870,
  author = {Shiro Hino and Makoto Nakayama and Kenji Takahashi and Hiroshi Funakubo and Eisuke Tokumitsu},
  title = {Characterization of Hafnium Oxide Thin Films by Sorce Gas Pulse Introduced Metalorganic Chemical Vapor Deposition using Amino-Family Hf Precursors},
  journal = {Jpn. J. Appl. Phys.},
  year = 2003,
}

@article{CTT100548651,
  author = {Kenji Takahashi and Makoto Nakayama and Shiro Hino and Eisuke Tokumitsu and Hiroshi Funakubo},
  title = {Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties},
  journal = {Integrated Ferroelectrics},
  year = 2003,
}

@article{CTT100507873,
  author = {Kenji Takahashi and Makoto Nakayama and Shintaro Yokoyama and Takeshi Kimura and Eisuke Tokumitsu},
  title = {Preparation of hafnium oxide films from oxygen-free Hf[N(C2H5)2]4 precursor and their properties},
  journal = {Applied Surface Science},
  year = 2003,
}