@article{CTT100584815,
  author = {Naoki Wakiya and Akinori Higuchi and Naonori Sakamoto and Nobuyasu Mizutani and Takanori Kiguchi and Hisao Suzuki and Kazuo Shinozaki},
  title = {Preparation of Epitaxial Pt Bottom Electrode and Tunability of (Ba,Sr)TiO3 Thin Film Deposited on Si Substrate},
  journal = {Ferroelectrics},
  year = 2008,
}

@article{CTT100523875,
  author = {木口賢紀 and 脇谷尚樹 and 水谷惟恭 and 篠崎和夫},
  title = {高分解能分析電子顕微鏡による二酸化セリウム/イットリア安定化ジルコニア/シリコンヘテロ界面構造の原子スケール構造評価},
  journal = {分析化学},
  year = 2006,
}

@article{CTT100584825,
  author = {Toshimi Nagase and Toshihiko Ooie and Yoji Makita and Masahiro Nakatsuka and Kazuo Shinozaki and Nobuyasu Mizutani},
  title = {A Novel Method for the Preparation of Green Photoluminescent Undoped Zinc Oxide Film Involving Excimer Laser Irradiation of a Sol-Gel-Derived Precursor},
  journal = {Jpn. J. Appl. Phys.},
  year = 2000,
}

@article{CTT100385540,
  author = {Hiroshi Funakubo and Nobuyasu Mizutani and Tetsuo Tatsuno},
  title = {Preparation of FeNx-TiN Films by CVD},
  journal = {J. Mater. Sci.},
  year = 1993,
}

@article{CTT100385497,
  author = {Hiroshi Funakubo and Katsuhiro Imashita and Nobuo Kieda and Nobuyasu Mizutani},
  title = {Formation of Epitaxial Pb(Zr,Ti)O3 Films by CVD},
  journal = {J. Ceram. Soc. Jpn.},
  year = 1991,
}

@article{CTT100536481,
  author = {脇谷尚樹 and 水谷惟恭 and 角野裕康 and 篠崎和夫 and 水谷惟恭},
  title = {ZnOバリスターの一粒界のI-V特性},
  journal = {日本セラミックス協会学術論文誌},
  year = 1991,
}

@article{CTT100422051,
  author = {Hiroshi Funakubo and Katsuhiro Imashita and Nobuyasu Mizutani},
  title = {Growth of Epitaxial PLZT film by CVD},
  journal = {J. Ceram. Soc. Jpn.},
  year = 1991,
}

@article{CTT100823741,
  author = {Hiroshi Funakubo and Nobuyasu Mizutani and Mikio Kobayashi and Nobuo Kieda and Masanori Kato},
  title = {Preparation of TaNx-TiN Films by CVD},
  journal = {J. Ceram. Soc. Jpn.},
  year = 1990,
}

@article{CTT100385495,
  author = {Hiroshi Funakubo and Nobuo Kieda and Masanori Kato and Nobuyasu Mizutani and Tetsuo Tatsuno},
  title = {Deposition Characteristics and Properties of Iron Nitride Films by CVD Using Organometallic Compound},
  journal = {J. Mater. Sci.},
  year = 1990,
}

@article{CTT100385496,
  author = {今下勝博 and 舟窪浩 and 木枝暢夫 and 加藤誠軌 and 水谷惟恭},
  title = {金属アルコキシドを原料としたＣＶＤ法によるTiO2-ZrO2薄膜の合成},
  journal = {日本化学会誌},
  year = 1990,
}

@article{CTT100385500,
  author = {舟窪浩 and 水谷惟恭 and 小林幹雄 and 木枝暢夫 and 加藤誠軌},
  title = {CVD法によるTaNx-TiN薄膜の合成},
  journal = {日本セラミックス協会学術論文誌},
  year = 1990,
}

@article{CTT100385501,
  author = {舟窪浩 and 小林幹雄 and 木枝暢夫 and 加藤誠軌 and 水谷惟恭},
  title = {CVD法による窒化タンタル薄膜の合成とその析出機構},
  journal = {化学工学論文集},
  year = 1990,
}

@article{CTT100385494,
  author = {Hiroshi Funakubo and Nobuo Kieda and Nobuyasu Mizutani and Masanori Kato},
  title = {Preparation of Iron Nitride Films from Organometallic Compound},
  journal = {J. Mater. Sci. Lett.},
  year = 1988,
}

@article{CTT100385499,
  author = {Hiroshi Funakubo and Nobuo Kieda and Nobuyasu Mizutani and Masanori Kato},
  title = {Preparation of Niobium Nitride Films by CVD},
  journal = {J. Ceram. Soc. Jpn.},
  year = 1987,
}

@inproceedings{CTT100590122,
  author = {脇谷尚樹 and 長宗豊和 and 文 志原 and 木口賢紀 and 水谷惟恭 and 鈴木久男 and 篠崎和夫},
  title = {PLD 法によるPb(Zr,Ti)O<sub>3</sub>薄膜作製におけるSrTiO<sub>3</sub>シード層と磁場印加効果},
  booktitle = {第17 回日本MRS 学術シンポジウム},
  year = 2006,
}

@inproceedings{CTT100476536,
  author = {伊能 教夫 and 竹山 雅夫 and 中山 実 and 日下部 治 and 太田口 和久 and 水谷 惟恭},
  title = {科学技術への深き学びを拓くために （東工大工学部におけるＦＤ研修会について）},
  booktitle = {工学・工業教育研究講演会講演論文集},
  year = 2002,
}