@article{CTT100718361, author = {Ichiro Kato and Ryuichi Maruyama and Kazuma Maeda and Hajime Moroda and Ichiro Kato and Masashi Inoue and Hiroyoshi Miyakawa}, title = {Detecting cells using non-negative matrix factorization on calcium imaging data}, journal = {Neural Networks}, year = 2014, } @article{CTT100634522, author = {Ichiro Kato and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa}, title = {Characteristics of Thermally Nitrided Silicon Dioxide Film and Plasma Enhancement}, journal = {Journal of Electronic Materials}, year = 1984, } @article{CTT100634515, author = {Ichiro Kato and Takashi Ito and Shnichi Inoue and Tetsuo Nakamura and Hajime Ishikawa}, title = {Ammonia Annealed SiO2 Films for Thin Gate Insulators}, journal = {Japanese Journal of Applied Physics. Supplement}, year = 1982, } @article{CTT100634514, author = {Takashi Ito and Ichiro Kato and Takao Nozak and Tetsuo Nakamura and Hajime Ishikawa}, title = {Plasma enhanced Thermal Nitridation of Silicon}, journal = {Applied Phisics Letters}, year = 1981, } @inproceedings{CTT100758323, author = {T. Yasunaga and M. Kobayashi and H. Kato and K. Fujii and M. Yashima and M. Kakihana}, title = {Synthesis of a novel oxynitride BaYSi2O5N and its photoluminescence property}, booktitle = {}, year = 2017, } @inproceedings{CTT100634618, author = {Takashi Ito and Ichiro Kato and Hajime Ishikawa}, title = {Plasma Enhancement in Direct Nitridation of Silicon and Silicon-Dioxide}, booktitle = {MRS Symp. Proc. 38}, year = 1985, } @inproceedings{CTT100634606, author = {Takashi Ito and Ichiro Kato and Tetsuo Nakamura and Hajime Ishikawa}, title = {Thermal Nitride Thin Films for VLSI Circuits}, booktitle = {Proc. of Symp. on Silicon Nitride Thin Insulating Films, ECS}, year = 1983, } @inproceedings{CTT100634608, author = {Ichiro Kato and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa}, title = {Plasma Nitrided Silicon Dioxide Film for VLSI Gate Dielectrics}, booktitle = {Elec. Mat. Conf.}, year = 1983, } @inproceedings{CTT100634601, author = {Ichiro Kato and Takashi Ito and Shinichi Inoue and Tetsuo Nakamura and Hajime Ishikawa}, title = {Ammonia Annealed SiO2. Films for Thin Gate Insulators}, booktitle = {Ext. Abs. on 13th Conf. on SSDM}, year = 1981, }