@article{CTT100675911,
  author = {Shunya Inoue and Junichi Kashino and Akihiro Matsutani and Hideo Ohtsuki and Takahiro Miyashita and Fumio Koyama},
  title = {Highly angular dependent high-contrast grating mirror and its application for transverse-mode control of VCSELs},
  journal = {Japanese Journal of Applied Physics(JJAP)},
  year = 2014,
}

@article{CTT100641302,
  author = {Akihiro Matsutani and Yuuki Hashidume and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl2/Xe-Inductively Coupled Plasma Etching},
  journal = {Jpn. J. Appl. Phys.},
  year = 2012,
}

@article{CTT100641301,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas Source},
  journal = {Japanese Journal of Applied Physics},
  year = 2011,
}

@article{CTT100641300,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Reactive Ion Etching of Si Using Ar/F2 Plasma},
  journal = {Jpn. J. Appl. Phys.},
  year = 2010,
}

@article{CTT100641299,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Generation of Solid-Source H2O Plasma and Its Application to Dry Etching of CaF2},
  journal = {Jpn. J. Appl. Phys.},
  year = 2008,
}

@article{CTT100641298,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Characterization of H2O-inductively coupled plasma for dry etching},
  journal = {Journal of Physics: Conference Series},
  year = 2008,
}

@article{CTT100641297,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Solid Source Dry Etching Process for GaAs and InP},
  journal = {Jpn. J. Appl. Phys.},
  year = 2006,
}

@article{CTT100641182,
  author = {Akihiro Matsutani and Hideo Ohtsuki and Ken Ohashi and Tomonori Yokoyama and Hirokazu Yamakage and FUMIO KOYAMA},
  title = {Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet},
  journal = {Jpn. J. Appl. Phys.},
  year = 2004,
}

@article{CTT100641178,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl2},
  journal = {Jpn. J. Appl. Phys.},
  year = 2003,
}

@article{CTT100641177,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Cl2-based Inductively Coupled Plasma Etching of InP Using Internal Antenna},
  journal = {Jpn. J. Appl. Phys.},
  year = 2003,
}

@article{CTT100641117,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {In situ Observation of Etching Profile in Inductively Coupled Plasma Etching of GaAs and InP using Long Distance Microscope},
  journal = {Jpn. J. Appl. Phys.},
  year = 2003,
}

@article{CTT100641116,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA and Kenichi Iga},
  title = {Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP},
  journal = {Jpn. J. Appl. Phys.},
  year = 2002,
}

@article{CTT100640957,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA and Kenichi Iga},
  title = {Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP},
  journal = {Jpn. J. Appl. Phys.},
  year = 2001,
}

@article{CTT100640956,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA and Kenichi Iga},
  title = {Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl2 Inductively Coupled Plasma},
  journal = {Jpn. J. Appl. Phys.},
  year = 2000,
}

@article{CTT100640892,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA and Kenichi Iga},
  title = {Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl2/Xe},
  journal = {Jpn. J. Appl. Phys.},
  year = 2000,
}

@article{CTT100640890,
  author = {Akihiro Matsutani and FUMIO KOYAMA and Hideo Ohtsuki and Kenichi Iga},
  title = {Vertical and Smooth Etching of InP by Cl2/Xe Inductively Coupled Plasma},
  journal = {Jpn. J. Appl. Phys.},
  year = 1999,
}

@inproceedings{CTT100698686,
  author = {Shunya Inoue and Akihiro Matsutani and Hideo Ohtsuki and Takahiro Miyashita and Fumio Koyama},
  title = {Dual beam single-mode vertical cavity surface emitting lasers using high-index contrast grating},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100695349,
  author = {Shunya Inoue and Akihiro Matsutani and Hideo Ohtsuki and Takahiro Miyashita and Fumio Koyama},
  title = {Beam engineering of VCSELs using High-index Contrast sub-wavelength Grating},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100660908,
  author = {Junichi Kashino and Shunya Inoue and Akihiro Matsutani and Hideo Ohtsuki and Takahiro Miyashita and Fumio Koyama},
  title = {Transverse Mode Control of VCSELs Using Angular Dependent High-contrast Grating Mirror},
  booktitle = {},
  year = 2013,
}

@inproceedings{CTT100645667,
  author = {Akihiro matsutani and Hideo Ohtsuki and Ayako Takada},
  title = {Microfabrication of Si based Microchannel for Transport of Bacterial Cells by Ar/F2 Vapor Etching and Cl2 Inductively Coupled Plasma Etching},
  booktitle = {},
  year = 2012,
}

@inproceedings{CTT100643687,
  author = {松谷晃宏 and 大槻秀夫 and 小山二三夫},
  title = {CO2プラズマによるSiのドライエッチング},
  booktitle = {},
  year = 2012,
}