@article{CTT100705019,
  author = {Akihiro Matsutani and Fumitaka Ishiwari and Yoshiaki Shoji and Takashi Kajitani and Takuya Uehara and Masaru Nakagawa and Takanori Fukushima},
  title = {Chlorine -based inductively coupled plasma etching of GaAs wafer using tripodal paraffinic triptycene as an etching resist mask},
  journal = {Japanese Journal of Applied Physics},
  year = 2016,
}

@inproceedings{CTT100676657,
  author = {松谷晃宏 and 石割文崇 and 庄子良晃 and 上原 卓也 and 中川 勝 and 福島孝典},
  title = {Cl2-誘導結合型プラズマエッチングにおけるヤヌス型トリプチセンTripC12のエッチング特性の評価},
  booktitle = {},
  year = 2014,
}