@article{CTT100911361,
  author = {Takanori Mimura and Reijiro Shimura and Akinori Tateyama and Yoshiko Nakamura and Takahisa Shiraishi and Hiroshi Funakubo},
  title = {No-Heating deposition of ferroelectric x%Y-doped (100–x%)(Hf1−yZry)O2 films},
  journal = {Phys. Status Solidi A},
  year = 2023,
}

@article{CTT100874609,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Takahisa Shiraishi and Takao Shimizu and Tomoaki Yamada and Yoshitomo Tanaka and Yukari Inoue and Hiroshi Funakubo},
  title = {No-Heating Deposition of 1-μm-Thick Y-Doped HfO2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method},
  journal = {Phys. Status Solidi RRL},
  year = 2022,
}

@article{CTT100864745,
  author = {Shinya Kondo and Reijiro Shimura and Takashi Teranishi and Akira Kishimoto and Takanori Nagasaki and Hiroshi Funakubo and Tomoaki Yamada},
  title = {Influence of orientation on electro-optic effect in epitaxial Y-doped HfO2 ferroelectric thin films},
  journal = {Jpn. J. Appl. Phys.},
  year = 2021,
}

@article{CTT100863340,
  author = {Shinya Kondo and Reijiro Shimura and Takashi Teranishi and Akira Kishimoto and Takanori Nagasaki and Hiroshi Funakubo and Tomoaki Yamada},
  title = {Linear electro-optic effect in CMOS-compatible ferroelectric HfO2-based epitaxial thin films},
  journal = {Jpn. J. Appl. Phys. RAPID COMMUNICATION},
  year = 2021,
}

@article{CTT100852331,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Takao Shimizu and Tomoaki Yamada and Hiroshi Funakubo},
  title = {Preparation of 1 μm-thick Y-doped HfO2 ferroelectric films on (111)Pt/TiOx/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties},
  journal = {Jpn. J. Appl. Phys.},
  year = 2021,
}

@article{CTT100849008,
  author = {Reijiro Shimura and Takanori Mimura and Takao Shimizu and Yoshitomo Tanaka and Yukari Inoue and Hiroshi Funakubo},
  title = {Preparation of near-1-μm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by an RF magnetron sputtering method},
  journal = {J.Ceram. Soc. Jpn},
  year = 2020,
}

@article{CTT100814283,
  author = {P. T. Tue and Reijiro Shimura and T. Shimoda and Yuzuru Yakamura},
  title = {Direct integration of piezo-actuator array with active-matrix oxide thin-film transistors using a low-temperature solution process},
  journal = {Sensors and Actuators A: Physical},
  year = 2019,
}

@article{CTT100820691,
  author = {Phan Trong Tue and Reijiro Shimura and Kazuhiro Fukada and Keisuke Satou and Jinwang Li and Tatsuya Shimoda and Yuzuru Takamura},
  title = {EFFECT OF ULTRAVIOLET/OZONE TREATMENT ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF SOLUTION-PROCESSED PIEZOELECTRIC THICK-FILM LEAD-ZIRCONIUM-TITANATE (PZT)},
  journal = {International Journal of Nanotechnology},
  year = 2018,
}

@inproceedings{CTT100914312,
  author = {Hiroshi Funakubo and Yuma Takahashi and Takahisa Shiraishi and Kodera Masanori and Reijiro Shimura and Takanori Mimura and Keisuke Ishihama and Kazuki Okamoto and Hiroki Moriwake and Ayako Taguchi and Takao Shimizu and Yasuhiro Fujii and Akitoshi Koreeda},
  title = {Stabilization and Identification of Ferroelectric HfO2 Thin Films},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100874648,
  author = {Shinya Kondo and Reijiro Shimura and Takashi Teranishi and Akira Kishimoto and Takanori Nagasaki and Hiroshi Funakubo and Tomoaki Yamada},
  title = {Electro-optic properties in ferroelectric HfO2-based epitaxial thin films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867239,
  author = {高橋雄真 and 白石貴久 and 小寺正徳 and 志村礼司郎 and 三村和仙 and 森分博紀 and 田口綾子 and 舟窪浩},
  title = {HfO2基強誘電体膜のラマン分光測定},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867236,
  author = {近藤真矢 and 志村礼司郎 and 寺西貴志 and 岸本昭 and 長崎正雅 and 舟窪浩 and 山田智明},
  title = {Y添加HfO2強誘電体エピタキシャル薄膜の電気光学効果},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865369,
  author = {Funakubo, H. and Shimura, R. and Mimura, T. and Tateyama, A. and Nakamura, Y. and Shimizu, T. and Yamada, T. and Tanaka, Y. and Inoue, Y.},
  title = {Low temperature preparation of thick Y-HfO2 ferroelectric films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865541,
  author = {近藤真矢 and 志村礼司郎 and 舟窪浩 and 寺西貴志 and 岸本昭 and 山田智明},
  title = {エピタキシャルHfO2基強誘電体薄膜の電気光学特性},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865036,
  author = {Hiroshi Funakubo and Takanori Mimura and Reijiro Shimura and Yoshiko Nakamura and Takao Shimizu},
  title = {Stability and Room Temperature Deposition of Ferroelectric Phase in Y-Doped (Hf, Zr)O2 Films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853373,
  author = {海老原凌 and 吉田慎哉 and 志村礼司郎 and 舟窪浩 and 田中秀治},
  title = {Y2O3-HfO2強誘電体薄膜を搭載したMEMSユニモルフカンチレバーの作製と特性評価},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853366,
  author = {志村礼司郎 and 三村和仙 and 舘山明紀 and 清水荘雄 and 白石貴久 and 舟窪浩},
  title = {スパッタリング法によるY-HZO強誘電体厚膜の室温製膜とその電気特性および圧電特性評価},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853255,
  author = {志村礼司郎 and 三村和仙 and 舘山明紀 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法によるHfO2基強誘電体厚膜のシリコン基板上への室温製膜とその電気特性および圧電特性評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821832,
  author = {志村礼司郎 and 三村和仙 and 舘山明紀 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法によるHfO2基強誘電体厚膜の室温製膜とその電気特性評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821765,
  author = {志村礼司郎 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法を用いたY:HfO2強誘電体厚膜の作製とその電気特性評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806476,
  author = {志村礼司郎 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法により配向制御したHfO2基強誘電体厚膜の作製およびその電気特性評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100804201,
  author = {志村礼司郎 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法によるHfO2基強誘電体の厚膜化とその電気特性評価},
  booktitle = {},
  year = 2018,
}

@misc{CTT100836447,
  author = {三村和仙 and 志村礼司郎 and 舟窪浩 and 清水荘雄},
  title = {HfO2およびZrO2基強誘電体膜の厚膜化と室温合成},
  year = 2020,
}