@book{CTT100891827,
  author = {鈴木一明},
  title = {EUVリソグラフィと露光装置},
  publisher = {株式会社 AndTech},
  year = 2023,
}

@book{CTT100823615,
  author = {Bruce W. Smith and Kazuaki Suzuki},
  title = {Microlithography, Science and Technology, Third Edition},
  publisher = {CRC Press},
  year = 2020,
}

@book{CTT100818794,
  author = {T. Miura and Kazuaki Suzuki and H. Arimoto and S. Kawata},
  title = {Chap.9 Electron Projection Lithography},
  publisher = {World Scientific Publishing},
  year = 2008,
}

@book{CTT100818079,
  author = {Kazuaki Suzuki and Bruce W. Smith},
  title = {Microlithography, Science and Technology, Second Edition},
  publisher = {CRC Press},
  year = 2007,
}

@book{CTT100818674,
  author = {鈴木一明},
  title = {パターン露光装置（I）},
  publisher = {サイエンス・フォーラム},
  year = 1991,
}

@article{CTT100818069,
  author = {Kazuaki Suzuki and Ian Haig},
  title = {Investigation of the application of phase contrast imaging using a point X-ray source to industrial non-destructive testing},
  journal = {Phil. Trans. R. Soc. A},
  year = 2014,
}

@article{CTT100818099,
  author = {O. R.  Wood II and W. J. Trybula and J. Greschner and S. Kalt and T. Bayer and S. Shimizu and H. Yamamoto and Kazuaki Suzuki and M. S.  Gordon and C. F. Robinson and R. S.  Dhaliwal and C. W.  Thiel and N. Caldwell and M. S.  Lawliss and C. Huang},
  title = {Ultrathin membrane masks for electron projection lithography},
  journal = {J. Vac. Sci. Technol. B},
  year = 2004,
}

@article{CTT100818091,
  author = {Kazuaki Suzuki and N. Hirayanagi and T. Fujiwara and A. Yamada and J. Ikeda and T. Yahiro and S. Kojima and J. Udagawa and H. Yamamoto and N. Katakura and M. Suzuki and T. Aoyama and H. Takekoshi and T. Umemoto and H. Shimizu and S. Fukui and S. Suzuki and T. Okino and Y. Ohkubo and T. Shimoda and T. Tanida and Y. Watanabe and Y. Kohama and K. Ohmori and F. Mori and S. Takemoto and T. Yoshioka and H. Hirose and K. Morita and K. Hada and S. Kawata and Y. Kakizaki and T. Miura},
  title = {Full-field exposure performance of electron projection lithography tool},
  journal = {J. Vac. Sci. Technol. B},
  year = 2004,
}

@article{CTT100818110,
  author = {Kazuaki Suzuki and T. Fujiwara and S.  Kojima and N. Hirayanagi and T. Yahiro and J. Udagawa and S. Shimizu and H. Yamamoto and M. Suzuki and H. Takekoshi and S. Fukui and M. Hamashima and J. Ikeda and T. Okino and H. Shimizu and S. Takahashi and A. Yamada and T. Umemoto and S. Katagiri and Y. Ohkubo and T. Shimoda and K. Hirose and T. Tanida and Y. Watanabe and T. Kaminaga and Y. Kohama and F. Mori and S. Takemoto and T. Yoshioka and H. Hirose and K. Morita and K. Hada and S. Kawata and T. Sato and Y. Sato and M. Tokunaga and K. Okamoto and Y. Kakizaki and T. Miura},
  title = {First dynamic exposure results from an electron projection lithography tool},
  journal = {J. Vac. Sci. Technol. B},
  year = 2003,
}

@article{CTT100818113,
  author = {Kazuaki Suzuki and S. Shimizu},
  title = {Development status of EPL technology},
  journal = {J. Photopolym. Sci. Technol.},
  year = 2002,
}

@article{CTT100818120,
  author = {S. Kawata and M. Hamashima and T. Miura and Kazuaki Suzuki and K. Okamoto and T. Yamaguchi},
  title = {Progress and preliminary results on EB stepper},
  journal = {JPN. J. APPL. PHYS.},
  year = 2002,
}

@article{CTT100818125,
  author = {T. Yahiro and N. Hirayanagi and T. Irita and H. Shimizu and Kazuaki Suzuki},
  title = {High-accuracy aerial image measurement for electron beam projection lithography},
  journal = {J. Microtith., Microfab., Microsyst.},
  year = 2002,
}

@article{CTT100818131,
  author = {T. Yahiro and S. Suzuki and T. Irita and S. Kawata and Kazuaki Suzuki},
  title = {Direct measurement of chromatic aberrations induced by SiNx continuous membrane mask},
  journal = {J. Vac. Sci. Technol. B},
  year = 2002,
}

@article{CTT100818135,
  author = {T. Yahiro and S. Suzuki and T. Irita and N. Hirayanagi and H. Shimizu and S. Kojima and K. Morita and S. Kawata and T. Okino and Kazuaki Suzuki},
  title = {Direct measurement of Coulomb effects in electron beam projection lithography},
  journal = {J. Vac. Sci. Technol. B},
  year = 2001,
}

@article{CTT100818141,
  author = {S.D. Golladay and H.C. Pfeiffer and C.A. Bohnenkamp and R.S. Dhaliwal and W.A. Enichen and M.S. Gordon and R.A. Kendall and J.E. Lieberman and W. Stickel and J.D. Rockrohr and E.V. Tressler and A. Tanimoto and T. Yamaguchi and K. Okamoto and Kazuaki Suzuki and T. Miura and T. Okino and S. Kawata and K. Morita and S. Suzuki and H. Shimizu and S. Kojima and G. Varnell and W.T. Novak and M. Sogard},
  title = {PREVAIL - EPL alpha tool: Early results},
  journal = {J. Vac. Sci. Technol. B},
  year = 2001,
}

@article{CTT100818145,
  author = {H.C. Pfeiffer and R.S. Dhaliwal and S.D. Golladay and S.K. Doran and M.S. Gordon and T.R. Groves and R.A. Kendall and J.E. Lieberman and P.E. Petric and D.J. Pinckney and R.J. Quickle and C.F. Robinson and J.D. Rockrohr and J.J. Senesi and W. Stickel and E.V. Tressler and A. Tanimoto and T. Yamaguchi and K. Okamoto and Kazuaki Suzuki and T. Okino and S. Kawata and K. Morita and S. Suzuki and H. Shimizu and S. Kojima and G. Varnell and W.T. Novak and D.P. Stumbo and M. Sogard},
  title = {Projection reduction exposure with variable axis immersion lenses: Next generation lithography},
  journal = {J. Vac. Sci. Technol. B},
  year = 1999,
}

@article{CTT100818156,
  author = {Kazuaki Suzuki and ken Ozawa and Osamu Tanitsu and Masato Go},
  title = {Dosage control for scanning exposure with pulsed energy fluctuation and exposed position jitter},
  journal = {JPN. J. APPL. PHYS.},
  year = 1995,
}

@article{CTT100818162,
  author = {Akira Miyaji and Kazuaki Suzuki and Akikazu Tanimoto},
  title = {Excimer lithography for ULSI},
  journal = {Optical and Quantum Electronics},
  year = 1993,
}

@article{CTT100818168,
  author = {Kazuaki Suzuki and Yukako Matsumoto and Masayuki Murayama},
  title = {The method of measuring optical performance in KrF excimer lithography},
  journal = {JPN. J. APPL. PHYS.},
  year = 1992,
}

@article{CTT100818660,
  author = {Y. Tanaka and M. Fujii and H. Inoue and Nobuyuki Kawai and K. Koyama and Y. Maejima and F. Makino and K.  Makishima and M. Matsuoka and K. Mitsuda and T. Murakami and J. Nishimura and M. Oda and Y. Ogawara and T. Ohashi and N. Shibazaki and Kazuaki Suzuki and I. Waki and T.  Yamagami and I. Kondo and H. Murakami and S. Hayakawa and T. Hirano and H. Kunieda and K. Masai and F. Nagase and N. Sato and Y. Tawara and S. Kitamoto and S. Miyamoto and H. Tsunemi and K. Yamashita and M. Nakagawa},
  title = {X-ray astronomy satellite Tenma},
  journal = {Publ. Astron. Soc. Japan},
  year = 1984,
}

@article{CTT100818647,
  author = {K. Mitsuda and H. Inoue and K. Koyama and K. Makishima and M. Matsuoka and Y. Ogawara and N. Shibazaki and Kazuaki Suzuki and Y. Tanaka and T. Hirano},
  title = {Energy spectra of low-mass binary X-ray sources observed from Tenma},
  journal = {Publ. Astron. Soc. Japan},
  year = 1984,
}

@article{CTT100818664,
  author = {K. Koyama and T. Ikegami and H. Inoue and Nobuyuki Kawai and K. Makishima and M. Matsuoka and K. Mitsuda and T. Murakami and Y. Ogawara and T. Ohashi and Kazuaki Suzuki and Y. Tanaka and I. Waki},
  title = {Performance verification of the gas scintillation proportional counters on board the Tenma Satellite},
  journal = {Publ. Astron. Soc. Japan},
  year = 1984,
}

@article{CTT100818645,
  author = {Kazuaki Suzuki and M. Matsuoka and H. Inoue and K. Mitsuda and T. Ohashi and Y. Tanaka and T. Hirano and S. Miyamoto},
  title = {Detection of iron K-emission lines from low-mass bunary X-ray sources; Scorpious X-1 and 4U 1608-52},
  journal = {Publ. Astron. Soc. Japan},
  year = 1984,
}

@article{CTT100818654,
  author = {T. Ohashi and H. Inoue and K. Koyama and F. Makino and M. Matsuoka and Kazuaki Suzuki and Y. Tanaka and S. Hayakawa and H. Tsunemi and K. Yamashita},
  title = {Properties of the iron line from Vela X-1},
  journal = {Publ. Astron. Soc. Japan},
  year = 1984,
}

@inproceedings{CTT100806995,
  author = {Norihiro Matsunaga and Tomoya Sato and Atsushi Yamada and Masayuki Zaike and Toshinori Tsuruya and Tadashi Hatano and Masashi Yamamoto and Kazuaki Suzuki},
  title = {Application of a compact X-ray source with small focal spot using a 950 keV linear accelerator},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100818051,
  author = {Norihito Matsunaga and Tomoya Sato and Atsushi Yamada and Masayuki Zaike and Toshinori Tsuruya and Kosuke Nakanishi and Tadashi Hatano and Masashi Yamamoto and Kazuaki Suzuki},
  title = {Development of 950 kV X-ray source with small focal spot using a linear accelerator},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100818184,
  author = {T. Toki and P. Izikson and J. Kosugi and N. Sakasai and K. Saotome and Kazuaki Suzuki and D. Kandel and J. Robinson and Y. Koyanagi},
  title = {Simultaneous optimization of dose and focus controls in advanced ArF immersion scanners},
  booktitle = {Proceeding of SPIE},
  year = 2010,
}

@inproceedings{CTT100818413,
  author = {T. Miura and K. Murakami and Kazuaki Suzuki and Y. Kohama and K. Morita and K. Hada and Y. Ohkubo and H. Kawai},
  title = {Nikon EUVL development progress update},
  booktitle = {Proceeding of SPIE},
  year = 2008,
}

@inproceedings{CTT100818436,
  author = {T. Miura and K. Murakami and Kazuaki Suzuki and Y. Kohama and K. Morita and K. Hada and Y. Ohkubo},
  title = {Nikon EUVL development progress update},
  booktitle = {Proceeding of SPIE},
  year = 2007,
}

@inproceedings{CTT100818781,
  author = {鈴木一明},
  title = {EUVリソグラフィの最新状況と高エネルギーリソグラフィに対する一考察},
  booktitle = {第155回JOEM講演要旨集},
  year = 2006,
}

@inproceedings{CTT100818446,
  author = {T. Miura and K. Murakami and Kazuaki Suzuki and Y. Kohama and Y. Ohkubo and T. Asami},
  title = {Nikon EUVL development progress summary},
  booktitle = {Proceeding of SPIE},
  year = 2006,
}

@inproceedings{CTT100818461,
  author = {C. Romeo and P. Cantu and D. Henry and H. Takekoshi and N. Hirayanagi and Kazuaki Suzuki and M. McCallum and H. Fujita and T. Takikawa and M. Hoga},
  title = {Device based evaluation of electron projection lithography},
  booktitle = {Proceeding of SPIE},
  year = 2005,
}

@inproceedings{CTT100818501,
  author = {T. Miura and S. Kawata and K. Hada and Y. Kakizaki and M. Miyazaki and Kazuaki Suzuki and N. Hirayanagi and A. Yamada and J. Ikeda and T. Yahiro and J. Udagawa and H. Takekoshi and T. Umemoto and Y. Ohkubo and T. Shimoda and T. Tanida and Y. Watanabe and K. Ohmori and F. Mori and S. Takemoto and T. Yoshioka and K. Morita},
  title = {Nikon EPL tool: the latest development status and results},
  booktitle = {Proceeding of SPIE},
  year = 2005,
}

@inproceedings{CTT100818510,
  author = {T. Fujiwara and N. Hirayanagi and J. Udagawa and J. Ikeda and S. Shimizu and H. Takekoshi and Kazuaki Suzuki},
  title = {Total performance of Nikon EB stepper R&D tool},
  booktitle = {Proceeding of SPIE},
  year = 2004,
}

@inproceedings{CTT100818517,
  author = {J. Ikeda and A. Yamada and S. Shimizu and N. Hirayanagi and Kazuaki Suzuki},
  title = {Application of electron projection lithography to contacts in 65nm node and beyond},
  booktitle = {Digest of papers of 16th MicoProcesses and Nanotechnology Conference},
  year = 2003,
}

@inproceedings{CTT100821298,
  author = {鈴木一明},
  title = {電子線投影露光装置（EPL）},
  booktitle = {NGL2003 次世代リソグラフィワークショップ予稿集},
  year = 2003,
}

@inproceedings{CTT100818519,
  author = {Sumito Shimizu and Kazuaki Suzuki},
  title = {CD controllability of proximity effect correction in EPL},
  booktitle = {Proceeding of SPIE},
  year = 2003,
}

@inproceedings{CTT100818543,
  author = {H. Yamamoto and T. Aoyama and N. Hirayanagi and Kazuaki Suzuki},
  title = {Distortion management strategy for EPL reticles},
  booktitle = {Proceeding of SPIE},
  year = 2003,
}

@inproceedings{CTT100821292,
  author = {N. Hirayanagi and T. Fujiwara and K. Hada and T. Shimoda and Kazuaki Suzuki},
  title = {Nikon EB stepper: its system design and preliminary performance},
  booktitle = {Proceeding of SPIE},
  year = 2003,
}

@inproceedings{CTT100818562,
  author = {Kazuaki Suzuki},
  title = {EPL Technology Development},
  booktitle = {Proceeding of SPIE},
  year = 2002,
}

@inproceedings{CTT100818571,
  author = {Kazuaki Suzuki and T. Fujiwara and K. Hada and N. Hirayanagi and S. Kawata and K. Morita and K. Okamoto and T. Okino and S Shimizu and T. Yahiro and H. Yamamoto},
  title = {Nikon EB stepper: the latest development status},
  booktitle = {Proceeding of SPIE},
  year = 2001,
}

@inproceedings{CTT100818576,
  author = {T. Fujiwara and T. Irita and S. Shimizu and H. Yamamoto and Kazuaki Suzuki},
  title = {Highly accurate CD control at stitching region for electron-beam projection lithography},
  booktitle = {Proceeding of SPIE},
  year = 2001,
}

@inproceedings{CTT100821302,
  author = {Kazuaki Suzuki},
  title = {Nikon's lithography roadmap and the development status of EB Stepper},
  booktitle = {Proceeding of SEMI Technology Symposium 2000},
  year = 2000,
}

@inproceedings{CTT100818621,
  author = {K. Morita and T. Yahiro and S. Shimizu and H. Yamamoto and N. Hirayanagi and T. Fujiwara and S. Suzuki and H. Shimizu and S. Kawata and T. Okino and Kazuaki Suzuki},
  title = {Data of scattered electron characteristics in 100kV EB stepper},
  booktitle = {Proceeding of SPIE},
  year = 2000,
}

@inproceedings{CTT100818608,
  author = {T. Okino and Kazuaki Suzuki and K. Okamoto and S. Kawata and K. Uchikawa and S. Suzuki and S. Shimizu and T. Fujiwara and A. Yamada and K. Kamijo},
  title = {Investigation of proximy effect correction in electron projection lithography (EPL)},
  booktitle = {Proceeding of SPIE},
  year = 2000,
}

@inproceedings{CTT100818585,
  author = {Kazuaki Suzuki and T. Fujiwara and K. Hada and N. Hirayanagi and S. Kawata and K. Morita and K. Okamoto and T. Okino and S. Shimizu and T. Yahiro},
  title = {Nikon EB stepper: its system concept and countermeasure for critical issues},
  booktitle = {Proceeding of SPIE},
  year = 2000,
}

@inproceedings{CTT100818171,
  author = {Kazuaki Suzuki and Shinji Wakamoto and Kenji Nishi},
  title = {KrF step and scan exposure system using higher N.A. projection lens},
  booktitle = {Proceeding of SPIE},
  year = 1996,
}

@inproceedings{CTT100818626,
  author = {Kazuaki Suzuki},
  title = {Photo-stitchnig by a high resolution optical stepper},
  booktitle = {Digest of papers of 1st MicroProcess Conference},
  year = 1988,
}

@misc{CTT100911714,
  author = {鈴木一明},
  title = {EUVリソグラフィと露光装置},
  year = 2024,
}

@misc{CTT100843510,
  author = {鈴木一明},
  title = {卓越博士育成のための産学協創教育－東京工業大学 物質・情報卓越教育院の取り組み－},
  year = 2021,
}

@misc{CTT100818172,
  author = {鈴木一明},
  title = {X線CT技術},
  year = 2017,
}

@misc{CTT100818173,
  author = {鈴木一明},
  title = {露光装置の性能を最大限活用するAPC/AEC},
  year = 2010,
}

@misc{CTT100821663,
  author = {鈴木一明},
  title = {Alternative Lithographic Technologies (SPIE Advanced Lithography 2009)},
  year = 2009,
}

@misc{CTT100818180,
  author = {S. P. Renwick and D. Williamson and Kazuaki Suzuki and K. Murakami},
  title = {Optical Lithography in the Extreme UV},
  year = 2007,
}

@misc{CTT100821664,
  author = {鈴木一明},
  title = {The 3rd International EPL Workshop Report},
  year = 2004,
}

@misc{CTT100821303,
  author = {鈴木一明},
  title = {EPL技術},
  year = 2003,
}

@misc{CTT100821665,
  author = {鈴木一明},
  title = {ニコンのEPL装置},
  year = 2002,
}

@misc{CTT100818666,
  author = {鈴木一明},
  title = {電子ビームリソグラフィ技術},
  year = 2000,
}

@misc{CTT100818670,
  author = {K. Okamoto and Kazuaki Suzuki and H. Pfeiffer and M. Sogard},
  title = {High-throughput e-beam stepper lithography},
  year = 2000,
}

@misc{CTT100818785,
  author = {鈴木一明},
  title = {EPL技術の特徴と今後の展望},
  year = 2000,
}

@misc{CTT100818672,
  author = {鈴木一明},
  title = {256MDRAM量産対応スキャン形エキシマレーザステッパ「NSR-S201A」},
  year = 1995,
}

@misc{CTT100818673,
  author = {鈴木一明},
  title = {エキシマレーザステッパ},
  year = 1992,
}

@misc{CTT100818642,
  author = {鈴木一明 and 池上健 and 井上一 and 小山勝二 and 松岡勝 and 大橋隆哉 and 田中靖郎 and 和気泉},
  title = {「天馬」搭載蛍光比例計数管の特性},
  year = 1985,
}

@misc{CTT100818061,
  author = {鈴木一明},
  title = {微細化パターンの結像特性に基づくリソグラフィ用露光装置のシステム設計},
  year = 2017,
}



@phdthesis{CTT100818061,
  author = {鈴木一明},
  title = {微細化パターンの結像特性に基づくリソグラフィ用露光装置のシステム設計},
  school = {東京大学},
  year = 2017,
}