@article{CTT100818145,
  author = {H.C. Pfeiffer and R.S. Dhaliwal and S.D. Golladay and S.K. Doran and M.S. Gordon and T.R. Groves and R.A. Kendall and J.E. Lieberman and P.E. Petric and D.J. Pinckney and R.J. Quickle and C.F. Robinson and J.D. Rockrohr and J.J. Senesi and W. Stickel and E.V. Tressler and A. Tanimoto and T. Yamaguchi and K. Okamoto and Kazuaki Suzuki and T. Okino and S. Kawata and K. Morita and S. Suzuki and H. Shimizu and S. Kojima and G. Varnell and W.T. Novak and D.P. Stumbo and M. Sogard},
  title = {Projection reduction exposure with variable axis immersion lenses: Next generation lithography},
  journal = {J. Vac. Sci. Technol. B},
  year = 1999,
}