@article{CTT100664940,
  author = {B.Huang and T.Tomizuka and B.Xie and Y.Sakai and Q.Zhu and I.Song and A.Okino and F.Xiao and M.Watanabe and E.Hotta},
  title = {Simulation and mitigation of the magneto-Rayleigh-Taylor instabilities in Z-pinch gas discharge extreme ultraviolet plasma radiation sources},
  journal = {Physics of Plasmas},
  year = 2013,
}

@article{CTT100648654,
  author = {Y. Sakai and J. Rosenzweig and H. Kumai and Y. Nakanishi and Y. Ishizuka and S. Takahashi and T. Komatsu and Y. Xiao and H. Bin and Z. Qiushi and Y. Hayashi and I. Song and T. Kawamura and M. Watanabe and E. Hotta},
  title = {Observation of emission process in hydrogen-like nitrogen Z-pinch discharge with time integrated soft X-ray spectrum pinhole image},
  journal = {Physics of Plasmas},
  year = 2013,
}

@article{CTT100624778,
  author = {Bin Huang and Yasuhiro Takimoto and Masato Watanabe and Eiki Hotta},
  title = {Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source},
  journal = {Japanese Journal of Applied Physics},
  year = 2011,
}

@inproceedings{CTT100696062,
  author = {E. Hotta and Y. Sakai and Y. Hayashi and G. Niimi and B. Huang and Q. Zhu and I. Song and M. Watanabe},
  title = {Extreme ultraviolet light sources and soft x-ray laser based on discharge produced plasma},
  booktitle = {Proc. of SPIE},
  year = 2015,
}

@inproceedings{CTT100664938,
  author = {B.Huang and T.Tomizuka and M.Watanabe and E.Hotta},
  title = {Shock Waves and Magnetic Rayleigh Taylor Instabilities in Z-pinch Gas Discharge Produced Plasma Extreme Ultraviolet Sources},
  booktitle = {Proc. 26th Int. Microprocesses and Nanotechnology Conference (MNC2013)},
  year = 2013,
}

@inproceedings{CTT100636286,
  author = {冨塚 拓 and Huang Bin and 渡辺正人 and 堀田栄喜},
  title = {DPP方式によるEUV光源の電子密度の計測},
  booktitle = {電気学会研究会資料, 放電研究会},
  year = 2012,
}

@inproceedings{CTT100632345,
  author = {Eiki Hotta and Yusuke Sakai and Qiushi Zhu and Bin Huang and Hideaki Kumai and Masato Watanabe},
  title = {EUV and SXR Sources Based on Discharge Produced Plasma},
  booktitle = {2011 International Academic Symposium on Optoeletcronics and Microelectronics Technology (IASOMT 2011)},
  year = 2011,
}

@inproceedings{CTT100632363,
  author = {Bin Huang and Taku Tomizuka and Bin Xie and Masato Watanabe and Eiki Hotta},
  title = {Study of the initial gas distribution of a Z pinch Xe Discharge Produced Plasma source},
  booktitle = {The Papers of Joint Technical Meeting on Plasma Science and Technology and Pulsed Power Technology},
  year = 2011,
}

@inproceedings{CTT100629793,
  author = {Bin Huang and Bin Xie and Fei Jiang and Taku Tomizuka and Yasuhiro Takimoto and Masato Watanabe and Feng Xiao and Eiki Hotta},
  title = {Numerical study of the initial gas distribution on a gas jet plasma EUV source},
  booktitle = {Proceedings of 2011 Annual Conference of Fundamentals and Materials Society IEE Japan},
  year = 2011,
}

@inproceedings{CTT100628090,
  author = {Y. Takimoto and Huang Bin and O. Sakuchi and M. Watanabe and E. Hotta},
  title = {Study of a Gas Jet Type Z-pinch EUV Light Source},
  booktitle = {Frontiers of Particle Beam and High Energy Density Plasma Science using Pulse Power Technology},
  year = 2011,
}

@inproceedings{CTT100616424,
  author = {滝本泰大 and 黄 斌 and 渡邊正人 and 堀田栄喜},
  title = {同軸2重円筒ノズル型電極を用いたガスジェット型放電生成プラズマ光源に関する研究},
  booktitle = {電気学会研究会資料},
  year = 2010,
}

@inproceedings{CTT100617313,
  author = {B. Huang and Y. Takimoto and M. Watanabe and E. Hotta},
  title = {Xe-based Gas Jet Type Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithography},
  booktitle = {},
  year = 2010,
}

@inproceedings{CTT100612225,
  author = {渡邊正人 and 酒井雄祐 and 朱 秋石 and 黄 斌 and 石塚裕也 and 滝本泰大 and 堀田栄喜},
  title = {低気圧放電プラズマを用いた短波長光源の開発},
  booktitle = {平成22年電気学会基礎・材料・共通部門大会},
  year = 2010,
}

@inproceedings{CTT100611969,
  author = {Bin Huang and Yasuhiro Takimoto and Masato Watanabe and Eiki Hotta},
  title = {Xe-based Z-pinch gas jet type DPP EUV source for lithography},
  booktitle = {The Papaers of Joint Technical Meeting on Plasma Science and Pulsed Power Technology},
  year = 2010,
}

@inproceedings{CTT100609815,
  author = {Eiki Hotta and Yusuke Sakai and Zhu Qiushi and Yuya Ishizuka and Yasuhiro Takimoto and Huang Bin and Masato Watanabe},
  title = {R&D of EUV and SXR Light Sources at Tokyo Institute of Technology},
  booktitle = {2010 Academic Symposium on Optoelectronics and Microelectronics Technology and the 10th Chinese-Russian Symposium on Laser Physics and Laser Technologies},
  year = 2010,
}

@inproceedings{CTT100600752,
  author = {Bin Huang and Yasuhiro Takimoto and Masato watanabe and Eiki Hotta},
  title = {Xe-based Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithograph},
  booktitle = {The papers of Technical Meeting on Pulsed Power Technology},
  year = 2010,
}

@misc{CTT100691065,
  author = {Bin Huang},
  title = {Z-pinch Dynamics in a Xenon Gas Jet Type 13.5 nm Extreme Ultraviolet Plasma Source},
  year = 2014,
}

@misc{CTT100690133,
  author = {Bin Huang},
  title = {Z-pinch Dynamics in a Xenon Gas Jet Type 13.5 nm Extreme Ultraviolet Plasma Source},
  year = 2014,
}

@misc{CTT100667350,
  author = {Bin Huang},
  title = {Z-pinch Dynamics in a Xenon Gas Jet Type 13.5 nm Extreme Ultraviolet Plasma Source},
  year = 2014,
}



@phdthesis{CTT100691065,
  author = {Bin Huang},
  title = {Z-pinch Dynamics in a Xenon Gas Jet Type 13.5 nm Extreme Ultraviolet Plasma Source},
  school = {東京工業大学},
  year = 2014,
}

@phdthesis{CTT100690133,
  author = {Bin Huang},
  title = {Z-pinch Dynamics in a Xenon Gas Jet Type 13.5 nm Extreme Ultraviolet Plasma Source},
  school = {東京工業大学},
  year = 2014,
}

@phdthesis{CTT100667350,
  author = {Bin Huang},
  title = {Z-pinch Dynamics in a Xenon Gas Jet Type 13.5 nm Extreme Ultraviolet Plasma Source},
  school = {東京工業大学},
  year = 2014,
}