@inproceedings{CTT100942253,
  author = {Hiroyoshi Tanabe and Moe Sugiyama and Masayuki Shimoda and Atsushi Takahashi},
  title = {STCC formula including polarization and M3D effects in high-NA EUV lithography},
  booktitle = {Proc. SPIE},
  year = 2026,
}

@inproceedings{CTT100942254,
  author = {Moe Sugiyama and Masayuki Shimoda and Hiroyoshi Tanabe and Atsushi Takahashi},
  title = {EUV M3D parameter prediction of curvilinear mask patterns by convolutional neural networks},
  booktitle = {Proc. SPIE},
  year = 2026,
}

@inproceedings{CTT100941179,
  author = {Atsushi Takahashi and Moe Sugiyama and Masayuki Shimoda and Hiroyoshi Tanabe},
  title = {Mask 3D Parameter Prediction in EUV Lithography by Convolutional Neural Network},
  booktitle = {IEEE Asia Pacific Conference on Circuits and Systems (APCCAS)},
  year = 2025,
}

@inproceedings{CTT100937711,
  author = {杉山萌 and 田邊容由 and 下田将之 and 高橋篤司},
  title = {EUVリソグラフィシミュレーション高速化のための CNN学習用カーブリニアマスクパターン生成},
  booktitle = {DAシンポジウム2025 論文集},
  year = 2025,
}