@article{CTT100625858, author = {Katsuhisa Mizoguchi and tomoya higashihara and mitsuru ueda}, title = {Negative-Working Photosensitive Poly(phenylene ether) Based on Poly(2,6-dimethyl-1,4-phenylene ether), a Cross-Linker, and a Photoacid Generator}, journal = {Macromolecules}, year = 2010, } @article{CTT100609520, author = {Y. Saito and K. Mizoguchi and T. Higashihara and M. Ueda}, title = {Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator}, journal = {J. Appl. Polym. Sci.}, year = 2009, } @article{CTT100609514, author = {Katsuhisa Mizoguchi and tomoya higashihara and mitsuru ueda}, title = {An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Crosslinker, and a Photobase Generator}, journal = {Macromolecules}, year = 2009, } @article{CTT100581836, author = {Katsuhisa Mizoguchi and Tomoya Higashihara and Mitsuru Ueda}, title = {Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Crosslinker, and a Photobase Generator}, journal = {Macromolecules}, year = 2009, } @article{CTT100581838, author = {Katsuhisa Mizoguchi and Tomoya Higashihara and Mitsuru Ueda}, title = {An Alkaline-Developable, Negative-Working Photosensitive Polybenzoxazole Based on Poly(o-hydroxyamide), a Vinyl Sulfone-Type Cross-Linker, and a Novel Photobase Generator}, journal = {Macromolecules}, year = 2009, } @article{CTT100576995, author = {katsuhisa mizoguchi and mitsuru ueda}, title = {Negative-type photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a crosslinker, and a photoacid generator}, journal = {J. Polym. Sci. Part-A, Polym. Chem}, year = 2008, } @article{CTT100577002, author = {Yu Shoji and Katsuhisa Mizoguchi and Mitsuru Ueda}, title = {Synthesis of Aramids by Polycondensation of Aromatic Dicarboxylic Acids with Aromatic Diamines Containing Ether Linkages}, journal = {Polym. J.}, year = 2008, } @article{CTT100577000, author = {Katsuhisa Mizoguchi and Mitsuru Ueda}, title = {Direct Patterning of Poly(ether ether sulfone) Using a Cross-linker and a Photoacid Generator}, journal = {Polym. J}, year = 2008, } @article{CTT100576997, author = {tomohito ogura and katsuhisa mizoguchi and mitsuru ueda}, title = {Development of Negative-type Photosensitive Polyimide, Based on Poly(amic acid)s, Photobase Generator, and Thermal Base Generator}, journal = {J. Photopolym. Sci.&Technol.}, year = 2008, } @article{CTT100576998, author = {yuta saito and katsuhisa mizoguchi and mitsuru ueda}, title = {Negative-type Chemically Amplified Photosensitive Novolac}, journal = {J. Photopolym. Sci.&Technol}, year = 2008, } @inproceedings{CTT100589014, author = {Yu Shoji and Katsuhisa Mizoguchi and Mitsuru Ueda}, title = {Synthesis of aramides by polycondensation of aromatic dicarboxylic acids with aromatic diamines containing ether linkages}, booktitle = {}, year = 2008, } @inproceedings{CTT100589016, author = {Katsuhisa Mizoguchi and Mitsuru Ueda}, title = {A negative-type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), an ester-type cross-linker, and a photobase generator}, booktitle = {}, year = 2008, } @inproceedings{CTT100588958, author = {Yuta Saito and Katsuhisa Mizoguchi and Tomoya Higashihara and Mitsuru Ueda}, title = {Negative-type Chemically Amplified Photosensitive Novolac}, booktitle = {}, year = 2008, } @inproceedings{CTT100589032, author = {齋藤 悠太 and 溝口 勝久 and 上田 充}, title = {高感度なネガ型ノボラック樹脂系レジストの開発}, booktitle = {}, year = 2008, } @inproceedings{CTT100589029, author = {溝口 勝久 and 上田 充}, title = {新規画像形成機構によるネガ型感光性ポリベンゾオキサゾールの開発}, booktitle = {}, year = 2008, } @inproceedings{CTT100589034, author = {荘司 優 and 溝口 勝久 and 上田 充}, title = {芳香族ジカルボン酸と芳香族ジアミンの重縮合によるアラミドの合成}, booktitle = {}, year = 2008, }