@article{CTT100641047,
  author = {Y. Saito and T. Higashihara and M. Ueda},
  title = {Direct Photo-Patterning of Poly(3-Hexylthiophene).},
  journal = {J Photopolym Sci Tech},
  year = 2011,
}

@article{CTT100609520,
  author = {Y. Saito and K. Mizoguchi and T.  Higashihara and M. Ueda},
  title = {Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator},
  journal = {J. Appl. Polym. Sci.},
  year = 2009,
}

@article{CTT100609518,
  author = {yuta saito and tomoya higashihara and mitsuru ueda},
  title = {Highly refractive and photosensitive polyimide},
  journal = {},
  year = 2009,
}

@article{CTT100609523,
  author = {Yuta Saito and Kazuya Matsumoto and T. Higashihara and mitsuru ueda},
  title = {A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator},
  journal = {Chem. Lett},
  year = 2009,
}

@article{CTT100576998,
  author = {yuta saito and katsuhisa mizoguchi and mitsuru ueda},
  title = {Negative-type Chemically Amplified Photosensitive Novolac},
  journal = {J. Photopolym. Sci.＆Technol},
  year = 2008,
}

@inproceedings{CTT100641960,
  author = {Yuta Saito and Tomoya Higashihara and Mitsuru Ueda},
  title = {Direct Patterning of Regioregular Poly(3-hexylthiophene)},
  booktitle = {},
  year = 2012,
}

@inproceedings{CTT100641951,
  author = {齋藤 悠太 and 酒井 良正 and 東原 知哉 and 上田 充},
  title = {感光性を有する高誘電率ゲート絶縁材料},
  booktitle = {Polym. Prepr. Jpn.},
  year = 2011,
}

@inproceedings{CTT100588958,
  author = {Yuta Saito and Katsuhisa Mizoguchi and Tomoya Higashihara and Mitsuru Ueda},
  title = {Negative-type Chemically Amplified Photosensitive Novolac},
  booktitle = {},
  year = 2008,
}

@inproceedings{CTT100589032,
  author = {齋藤 悠太 and 溝口 勝久 and 上田 充},
  title = {高感度なネガ型ノボラック樹脂系レジストの開発},
  booktitle = {},
  year = 2008,
}