@article{CTT100678925, author = {K. Ohsawa and A. Kato and T. Kanazawa and E. Uehara and Y. Miyamoto}, title = {Channel thickness dependence on InGaAs MOSFET with InP source for high current density}, journal = {IEICE Electronics Express}, year = 2014, } @article{CTT100642251, author = {Atsushi Kato and Toru Kanazawa and Shunsuke Ikeda and Yosiharu Yonai and Yasuyuki Miyamoto}, title = {Reduction of access resistance of InP/InGaAs composite-channel MOSFET with back source electrode}, journal = {IEICE Trans. Electron.}, year = 2012, } @article{CTT100628822, author = {R. Terao and T. Kanazawa and S. Ikeda and Y. Yonai and A. Kato and Y. Miyamoto}, title = {InP/InGaAs Composite MOSFETs with Regrown Source and Al2O3 gate dielectric Exhibiting Maximum Drain Current Exceeding 1.3 mA/μm}, journal = {Applied Phys. Exp.}, year = 2011, } @inproceedings{CTT100693229, author = {宮本恭幸 and 金澤 徹 and 米内義晴 and 加藤 淳 and 藤松基彦 and 柏野壮志 and 大澤一斗 and 大橋一水}, title = {低電圧/高速動作にむけたInGaAs MOSFETソース構造}, booktitle = {IEICE Technical Report}, year = 2014, } @inproceedings{CTT100679167, author = {Y. Miyamoto and T. Kanazawa and Y. Yonai and A. Kato and M. Fujimatsu and M. Kashiwano and K. Ohsawa and K. Ohashi}, title = {(Invited) InGaAs MOSFET Source Structures Toward High Speed/low Power Applications}, booktitle = {}, year = 2014, } @inproceedings{CTT100679165, author = {Y. Miyamoto and T. Kanazawa and Y. Yonai and A. Kato and K. Ohsawa and M. Oda and T. Irisawa and T. Tezuka}, title = {Heavily doped epitaxially grown source in InGaAs MOSFET for high drain current density}, booktitle = {}, year = 2013, } @inproceedings{CTT100679172, author = {大澤一斗 and 加藤淳 and 佐賀井健 and 金澤徹 and 上原英治 and 宮本恭幸}, title = {高電流密度化に向けたInPソースを有するIII-V-OI InGaAs MOSFETのチャネル厚依存性}, booktitle = {}, year = 2013, } @inproceedings{CTT100678939, author = {K. Ohsawa and A. Kato and T. Sagai and T. Kanazawa and E. Uehara and Y. Miyamoto}, title = {Channel thickness dependence on InGaAs MOSFET with n-InP source for high current density}, booktitle = {}, year = 2013, } @inproceedings{CTT100659719, author = {A. Kato and T. Kanazawa and Eiji Uehara and Y. Yonai and Y. Miyamoto}, title = {Sub-50-nm InGaAs MOSFET with n-InP source on Si substrate}, booktitle = {}, year = 2013, } @inproceedings{CTT100659775, author = {加藤淳 and 米内義晴 and 金澤徹 and 宮本恭幸}, title = {Si 基板上 InGaAs-MOSFET の微細化に関する研究}, booktitle = {}, year = 2013, } @inproceedings{CTT100659767, author = {加藤淳 and 米内義晴 and 金澤徹 and 宮本恭幸}, title = {Si 基板上 InGaAs-MOSFET の微細化に関する研究}, booktitle = {}, year = 2012, } @inproceedings{CTT100642421, author = {加藤淳 and 金澤徹 and 宮本恭幸}, title = {ソース裏面電極によるInP/InGaAsコンポジットチャネルMOSFETのアクセス抵抗低減}, booktitle = {}, year = 2011, } @inproceedings{CTT100628832, author = {A. Kato and T. Kanazawa and S. Ikeda and Y. Yonai and YASUYUKI MIYAMOTO}, title = {Reduction of Access Resistance of InP/InGaAs Composite-Channel MOSFET with A Back Source Electrode}, booktitle = {}, year = 2011, } @inproceedings{CTT100619804, author = {金澤 徹 and 寺尾 良輔 and 山口 裕太郎 and 池田 俊介 and 米内 義晴 and 加藤 淳 and 宮本 恭幸}, title = {裏面電極を有するⅢ-Ⅴ族量子井戸型チャネルMOSFET}, booktitle = {}, year = 2011, } @inproceedings{CTT100612622, author = {金澤徹 and 寺尾良輔 and 山口裕太郎 and 池田俊介 and 米内義晴 and 加藤淳 and 宮本恭幸}, title = {Si基板上貼付された裏面電極付InP/InGaAs MOSFET}, booktitle = {}, year = 2010, } @inproceedings{CTT100612623, author = {寺尾良輔 and 金澤徹 and 池田俊介 and 米内義晴 and 加藤淳 and 宮本恭幸}, title = {Al2O3ゲート絶縁膜および再成長ソースを有するサブミクロンInP/InGaAs n-MOSFET}, booktitle = {}, year = 2010, }