@inproceedings{CTT100632302,
  author = {木田憲之助 and 日野史郎 and 三浦 成久 and 今泉昌之 and 岸谷博昭 and 徳光永輔},
  title = {H(CH3)2Alを用いたMOCVD法SiC基板上へのAl2O3膜の形成とAl2O3/SiC MOSFETの電気的特性評価},
  booktitle = {},
  year = 2011,
}