@article{CTT100939706,
  author = {Ryota Uehara and Shinsuke Maekawa and Takehiro Seshimo and Sugawara Ryutaro and Takahiro Dazai and Kazufumi Sato and Kan Hatakeyama and Yuta Nabae and Teruaki Hayakawa},
  title = {The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA},
  journal = {Journal of Photopolymer Science and Technology},
  year = 2025,
}

@misc{CTT100929888,
  author = {早川晃鏡 and 前川伸祐 and 上原綾太 and 瀬下　武広　 and 太宰　尚宏　},
  title = {エッチングマスクパターンの製造方法及びエッチングマスクパターン形成用樹脂組成物},
  howpublished = {公開特許},
  year = 2024,
  month  = {},
  note   = {特願2024-067050(2024/04/17), 特開2024-159590(2024/11/08)}
}


@misc{CTT100929891,
  author = {早川晃鏡 and 前川伸祐 and 上原綾太 and 瀬下　武広 and 宮城　賢 and 太宰　尚宏},
  title = {エッチングマスクパターン形成用樹脂組成物、及びエッチングマスクパターンの製造方法},
  howpublished = {公開特許},
  year = 2024,
  month  = {},
  note   = {特願2024-066934(2024/04/17), 特開2024-160688(2024/11/14)}
}


@misc{CTT100929890,
  author = {早川晃鏡 and 前川伸祐 and 上原綾太 and 瀬下　武広　 and 太宰　尚宏},
  title = {エッチングマスクパターン形成用樹脂組成物、及びエッチングマスクパターンの製造方法},
  howpublished = {公開特許},
  year = 2024,
  month  = {},
  note   = {特願2023-073814(2023/04/27), 特開2024-158543(2024/11/08)}
}