@article{CTT100617488,
  author = {Toshifumi YUJI and Takuya URAYAMA and Shuitsu FUJII and Yoshitoki IIJIMA and Yoshifumi SUZAKI and Hiroshi AKATSUKA},
  title = {Basic Characteristics for PEN Film Surface Modification Using Atmospheric-Pressure Nonequilibrium Microwave Plasma Jet},
  journal = {Electronics and Communications in Japan},
  year = 2010,
}

@inproceedings{CTT100615441,
  author = {H. Kataoka and N. Mungkung and T. Yuji and M. Kawano and Y. Kiyota and D. Uesugi and K. Nakabayashi and Y. Suzaki and H. Shibata and N. Kashihara and K. Sakai and T. Bouno and H. Akatsuka},
  title = {Surface modification of silicon wafer by low-pressure high-frequency plasma chemical vapor deposition method},
  booktitle = {2010 24th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)},
  year = 2010,
}

@inproceedings{CTT100600808,
  author = {Toshifumi Yuji and Shinji Aoki and Yuimichi Kohno and Hiroshi Akatsuka},
  title = {Space Charge Measurements of Surface Cleaning Sample Using Atmospheric-Pressure Non-equilibrium Discharge Plasma Jet},
  booktitle = {The 2010 Annual Meeting Record, I.E.E. Japan},
  year = 2010,
}