@article{CTT100864919,
  author = {Pratyush Buragohain and Adam Erickson and Takanori Mimura and Hiroshi Funakubo and Alexei Gruverman},
  title = {Effect of film microstructure on the polarization switching behavior in ferroelectric Y:HfO2 thin films},
  journal = {Adv Functional Material},
  year = 2021,
}

@article{CTT100864855,
  author = {Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness dependence of phase stability in epitaxial (HfxZr1-x)O2 films},
  journal = {Physical review materials},
  year = 2021,
}

@article{CTT100864744,
  author = {Hiranaga Yoshiomi and Mimura Takanori and Shimizu Takao and Funakubo Hiroshi and Cho Yasuo},
  title = {High-precision Local C-V Mapping for Ferroelectrics Using Principal Component Analysis},
  journal = {Jpn. J. Appl. Phys.},
  year = 2021,
}

@article{CTT100863341,
  author = {Yuki Tashiro and Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Comprehensive study on the kinetic formation of the orthorhombic ferroelectric phase in epitaxial Y-doped ferroelectric HfO2 thin films},
  journal = {ACS Applied Electronic Materials 2021},
  year = 2021,
}

@article{CTT100863342,
  author = {Yuki Tashiro and Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Comprehensive study on the kinetic formation of the orthorhombic ferroelectric phase in epitaxial Y-doped ferroelectric HfO2 thin films},
  journal = {ACS Applied Electronic Materials 2021},
  year = 2021,
}

@article{CTT100852792,
  author = {Takanori Mimura and Takao Shimizu and Osami Sakata and Hiroshi Funakubo},
  title = {Large Thermal hysteresis of ferroelectric transition in HfO2-based ferroelectric films},
  journal = {Appl. Phys. Let.},
  year = 2021,
}

@article{CTT100852331,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Takao Shimizu and Tomoaki Yamada and Hiroshi Funakubo},
  title = {Preparation of 1 μm-thick Y-doped HfO2 ferroelectric films on (111)Pt/TiOx/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties},
  journal = {Jpn. J. Appl. Phys.},
  year = 2021,
}

@article{CTT100852833,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko J. Konnno and Osami Sakata and Hiroshi Funakubo},
  title = {Electric-field-induced ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2: Transformation from the paraelectric tetragonal phase to the ferroelectric orthorhombic phase},
  journal = {Physica Status Solidi},
  year = 2021,
}

@inproceedings{CTT100874691,
  author = {Hiranaga Y. and Mimura T. and Shimizu T. and Funakubo H. and Cho Y.},
  title = {Nanoscale Domain Dynamics Characterization Using Local C-V Mapping},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100874651,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Hiroshi Funakubo},
  title = {Ferroelectricity induced by the kinetic formation in Y-HfO2 epitaxial films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865369,
  author = {Funakubo, H. and Shimura, R. and Mimura, T. and Tateyama, A. and Nakamura, Y. and Shimizu, T. and Yamada, T. and Tanaka, Y. and Inoue, Y.},
  title = {Low temperature preparation of thick Y-HfO2 ferroelectric films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867233,
  author = {平永良臣 and Takanori Mimura and Shimizu Takao and HIROSHI FUNAKUBO and Yasuo Cho},
  title = {局所C-Vマッピングにおける主成分分析によるノイズ除去},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867241,
  author = {Shimizu, T. and Tashiro Y. and Takanori M. and Shiraishi T. and Kiguchi T. and Konno T. J. and Sakata O. and Funakubo H.},
  title = {Field-Induced Structural Change in HfO2-Based Ferroelectric Materials},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867239,
  author = {Yuma Takahashi and Takahisa Shiraishi and Masanori Kodera and Reijiro Shimura and Takanori Mimura and 森分博紀 and 田口綾子 and HIROSHI FUNAKUBO},
  title = {HfO2基強誘電体膜のラマン分光測定},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867226,
  author = {Shimizu Takao and Yuki Tashiro and Takanori Mimura and HIROSHI FUNAKUBO},
  title = {Y-置換HfO2基材料の強誘電性の発現},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865040,
  author = {Hiroshi Funakubo and Yuki Tashiro and Takanori Mimura and Takao Shimizu},
  title = {Phase stability of ferroelectric HfO2-based films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865673,
  author = {平永良臣 and Takanori Mimura and Shimizu Takao and HIROSHI FUNAKUBO and Yasuo Cho},
  title = {局所C-V曲線で観るナノスケール強誘電分極反転挙動},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865385,
  author = {Takao Shimizu and Takanori Mimura and Yuki Tashiro and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Field-induced structural change in HfO2-based ferroelectric materials},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865388,
  author = {Yoshiomi Hiranaga and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Local C-V Characterization for Ferroelectric Films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865540,
  author = {Shimizu, T. and Mimura, T. and Tashiro, Y. and Sakata, O. and Funakubo, H},
  title = {Phase transition in HfO2 ferroelectric materials investigated by XRD study},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865036,
  author = {Hiroshi Funakubo and Takanori Mimura and Reijiro Shimura and Yoshiko Nakamura and Takao Shimizu},
  title = {Stability and Room Temperature Deposition of Ferroelectric Phase in Y-Doped (Hf, Zr)O2 Films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865379,
  author = {Takao Shimizu and Takanori Mimura and Yuki Tashiro and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko J. Konno and Osami Sakata and Yoshio Katsuya and Hiroshi Funakubo},
  title = {Structure Change in the HfO2 Ferroelectric Materials Induced by an Electric Field},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853366,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Shimizu Takao and Takahisa Shiraishi and HIROSHI FUNAKUBO},
  title = {スパッタリング法によるY-HZO強誘電体厚膜の室温製膜とその電気特性および圧電特性評価},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853331,
  author = {平永良臣 and Takanori Mimura and Shimizu Takao and HIROSHI FUNAKUBO and Yasuo Cho},
  title = {強誘電体膜における分極反転挙動のナノスケールマッピング},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853324,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Thickness and composition dependences of epitaxial ferroelectric HfO2 based films},
  booktitle = {},
  year = 2021,
}

@misc{CTT100876024,
  author = {Shimizu Takao and Takanori Mimura and HIROSHI FUNAKUBO},
  title = {HfO2基材料における強誘電性の発現機構},
  year = 2021,
}