@book{CTT100836679, author = {Takao Shimizu and Hiroshi Funakubo}, title = {Chapter 4 - Epitaxial Growth of Doped HfO2 Ferroelectric Materials}, publisher = {Woodhead Publishing}, year = 2019, } @article{CTT100821130, author = {Hyeon Jun Lee and Takao Shimizu and Hiroshi Funakubo and Yasuhiko Imai and Osami Sakata and Seung Hyun Hwang and Tae Yeon Kim and Changjae Yoon and Cheng Dai and Long Q. Chen and Su Yong Lee and Ji Young Jo}, title = {Electric-Field-Driven Nanosecond Ferroelastic-Domain Switching Dynamics in Epitaxial Pb(Zr,Ti)O3 Film}, journal = {Phys. Rev. Lett.}, year = 2019, } @article{CTT100806762, author = {Yoshitaka Ehara and Takao Shimizu and Shintaro Yasui and Takahiro Oikawa and Takahisa Shiraishi and Hiroki Tanaka and Noriyuki Kanenko and Ronald Maran and Tomoaki Yamada and Yasuhiko Imai and Osami Sakata and Nagarajan Valanoor and Hiroshi Funakubo}, title = {Ferroelastic Domain Motion by Pulsed Electric Field in (111)/(11¯1 ) Rhombohedral Epitaxial Pb(Zr0.65Ti0.35)O3 Thin Films: Fast Switching and Rrelaxation}, journal = {Physical Review B}, year = 2019, } @article{CTT100821127, author = {Yoshiharu Ito and Akinori Tateyama and Yoshiko Nakamura and Takao Shimizu and Minoru Kurosawa and Hiroshi Uchida and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko J. Konno and Mutsuo Ishikawa and Hiroshi Funakubo}, title = {Growth of epitaxial (K, Na)NbO3 films with various orientations by hydrothermalmethod and their properties}, journal = {Jpn. J. Appl. Puys.}, year = 2019, } @article{CTT100821124, author = {Hidehisa Inoue and Takao Shimizu and Hiroshi Funakubo}, title = {Electric field-induced change in the crystal structure of MOCVD-Pb(Zr,Ti)O3 films near the phase boundary}, journal = {Jpn. J. Appl. Phys.}, year = 2019, } @article{CTT100821122, author = {Masanori Kodera and Takao Shimizu and Hiroshi Funakubo}, title = {Ferroelectric properties of epitaxial Bi2SiO5 thin films grown on SrTiO3 substrates with various orientations}, journal = {Jpn. J. Appl. Phys.}, year = 2019, } @article{CTT100803278, author = {Yoshiharu ITO and Akinori TATEYAMA and Yoshiko NAKAMURA and Takao SHIMIZU and Minoru KUROSAWA and Hiroshi UCHIDA and Takahisa SHIRAISHI and Takanori KIGUCHI and Toyohiko J. KONNO and Mutsuo ISHIKAWA and Hiroshi FUNAKUBO}, title = {Deposition of orientation-controlled thick (K, Na)NbO3 films on metal substrates by repeated hydrothermal deposition technique}, journal = {Journal of the Ceramic Society of Japan}, year = 2019, } @article{CTT100803550, author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo}, title = {Ferroelectricity in YO1.5-HfO2 films around 1 μm in thickness}, journal = {Appl. Phys. Lett.}, year = 2019, } @article{CTT100803267, author = {Kodai AOYAMA and Takao SHIMIZU and Hideto KURAMOCHI and Masami MESUDA and Ryo AKIIKE and Yoshisato KIMURA and Hiroshi FUNAKUBO}, title = {Evaluation of phase and thermoelectric properties of thin film SrSi2}, journal = {Journal of the Ceramic Society of Japan}, year = 2019, } @article{CTT100803277, author = {T. Shiraishi and S. Choi and T. Kiguchi and T. Shimizu and H. Funakubo and T. J. Konno}, title = {Formation of the orthorhombic phase in CeO2-HfO2 solid solution epitaxial thin films and their ferroelectric properties}, journal = {Appl. Phys. Lett.}, year = 2019, } @article{CTT100803188, author = {Akinori Tateyama and Yoshiharu Ito and Yoshiko Nakamura and Takao Shimizu and Yuichiro Orino and Minoru Kurosawa and Hiroshi Uchida and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko J. Konno and Nobuhiro Kumada and Hiroshi Funakubo}, title = {Effects of starting materials on the deposition behavior of hydrothermally synthesized {100}c -oriented epitaxial (K,Na)NbO3 thick films and their ferroelectric and piezoelectric properties}, journal = {J. Crystal Growth}, year = 2019, } @article{CTT100803191, author = {Takanori Mimura and Takao Shimizu and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo}, title = {Effects of heat treatment and in-situ high temperature XRD study on the formation of ferroelectric epitaxial Y doped HfO2 film.}, journal = {Jpn. J. Appl. Phys.}, year = 2019, } @article{CTT100803190, author = {Mutsuo Uehara and Atsuo Katagiri and Mao Kurokawa and Kensuke Akiyama and Takao Shimizu and Masaaki Matsushima and Hiroshi Uchida and Yoshisato Kimura and Hiroshi Funakubo}, title = {Preparation of CaMgSi and Ca7Mg7.25Si14 single phase films and their thermoelectric properties}, journal = {MRS Adv.}, year = 2019, } @inproceedings{CTT100821774, author = {Takao Shimizu and Yoshitaka Ehara and Takanori Mimura and Shintaro Yasui and Tomoaki Yamada and Yasuhiko Imai and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo}, title = {The Domain Switching in Rhombohedral PZT Observed by In Situ X-Ray Diffraction Study by Various Frequencies}, booktitle = {}, year = 2019, } @inproceedings{CTT100821767, author = {Hidehisa Inoue and Takao Shimizu and Hiroshi Funakubo}, title = {Crystal Structure Change with Electric Field for Pb(Zr,Ti)O3 Films with Near Phase Transition Composition Prepared by MOCVD}, booktitle = {}, year = 2019, } @inproceedings{CTT100821271, author = {HIROSHI FUNAKUBO and Hidehisa Inoue and Akinori Tateyama and Takao Shimizu}, title = {組成相境界近傍組成のPZT膜の電界による構造変化と圧電特性の評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100809753, author = {Kodai Aoyama and Takao Shimizu and Hideto Kuramochi and Masami Mesuda and Ryo Akiike and Keisuke Ide and Takayoshi Katase and Toshio Kamiya and Yoshisato Kimura and Hiroshi Funakubo}, title = {Expansion of Ba and Ca solubility limit into SrSi2 thin film and their thermoelectric properties}, booktitle = {}, year = 2019, } @inproceedings{CTT100821258, author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu}, title = {Phase stability and property control of ferroelectric HfO2 films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821775, author = {M. Kodera and A. Taguchi and T. Shimizu and H. Moriwake and H. Funakubo}, title = {Dielectric properties of ReO3-type oxyfluorides prepared by hydrothermal synthesis}, booktitle = {}, year = 2019, } @inproceedings{CTT100821754, author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo}, title = {Recent Progress on Ferroelectric HfO2 Epitaxial Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821755, author = {Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo}, title = {Stability of Ferroelectric Orthorhombic Phase in Epitaxial HfO2-based Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821753, author = {Yu-ki Tashiro and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo}, title = {Preparation and Characterization of Y, Zr-doped HfO2 Thin Film by PLD Method}, booktitle = {}, year = 2019, } @inproceedings{CTT100821766, author = {太田悠登 and Tomoaki Yamada and 吉野正人 and Takao Shimizu and HIROSHI FUNAKUBO and 長崎正雅}, title = {引張応力下(PbXSr1-X)TiO3薄膜の膜厚がドメイン構造に与える影響}, booktitle = {}, year = 2019, } @inproceedings{CTT100821765, author = {Reijiro Shimura and Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO}, title = {スパッタリング法を用いたY:HfO2強誘電体厚膜の作製とその電気特性評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100821760, author = {Hidehisa Inoue and Takao Shimizu and Hiroshi Funakubo}, title = {Crystal Structure Change of Tetragonal {100}-oriented Pb(Zr,Ti)O3 Films by Poling Process and under Applying Electric Field}, booktitle = {}, year = 2019, } @inproceedings{CTT100821749, author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo}, title = {The phase stability and epitaxial growth of HfO2-based ferroelectric materials}, booktitle = {}, year = 2019, } @inproceedings{CTT100821741, author = {Takanori Kiguchi and Takahisa Shiraishi and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Toyohiko J. Konno}, title = {Nanodomain Structure of Ferroelectric HfO2-Based Epitaxial Thin Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821732, author = {Takao Shimizu and Takanori Mimura and HIROSHI FUNAKUBO}, title = {Preparation of ferroelecttic HfO2 film with a nm-order thickness}, booktitle = {}, year = 2019, } @inproceedings{CTT100821731, author = {Yu-ki Tashiro and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo}, title = {Preparation and characterization of Y, Zr-doped HfO2 thin films by PLD method}, booktitle = {}, year = 2019, } @inproceedings{CTT100821728, author = {Yuki Tashiro and Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko Konno and HIROSHI FUNAKUBO}, title = {HfO2基薄膜の電界誘起相転移}, booktitle = {}, year = 2019, } @inproceedings{CTT100821722, author = {Akinori Tateyama and Yoshiharu Ito and Takao Shimizu and yuichiro orino and Minoru Kuribayashi Kurosawa and Takeshi Yoshimura and HIROSHI FUNAKUBO}, title = {水熱合成法で作製した(KxNa1-x)NbO3自己分極膜の圧電特性の評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100821719, author = {Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO}, title = {スパッタリング法を用いたY: HfO2強誘電体膜の室温成膜}, booktitle = {}, year = 2019, } @inproceedings{CTT100821715, author = {太田悠登 and Tomoaki Yamada and 吉野正人 and Takao Shimizu and HIROSHI FUNAKUBO and 長崎正雅}, title = {(PbxSr1-x)TiO3薄膜における組成及び膜厚がドメイン構造に及ぼす影響}, booktitle = {}, year = 2019, } @inproceedings{CTT100809788, author = {青山 航大 and 清水 荘雄 and 倉持 豪人 and 召田 雅実 and 秋池 良 and 井手 啓介 and 片瀬 貴義 and 神谷 利夫 and 木村 好里 and 舟窪 浩}, title = {二元同時スパッタ法で作製したAeSi2膜の作製}, booktitle = {}, year = 2019, } @inproceedings{CTT100821712, author = {Hidehisa Inoue and Takao Shimizu and HIROSHI FUNAKUBO}, title = {組成相境界近傍組成のPZT膜の電界による構造変化と圧電性の評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100821711, author = {T. Mimura and T. Shimizu and Y. Katsuya and O. Sakata and H. Funakubo}, title = {Thickness- and orientationdependence of Curie temperature of ferroelectric epitaxial HfO2 based films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821257, author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu}, title = {Fundamental Characteristics of Ferroelectric HfO2 Using Epitaxial Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821268, author = {舟窪浩 and 伊東良晴 and 舘山明紀 and 清水荘雄 and 黒澤実 and 内田寛 and 白石貴久}, title = {水熱合成法で作製した自己配向性(K,Na)NbO3厚膜の作製と評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100821699, author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo}, title = {Ferroelectricity in thick HfO2-based films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821700, author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo}, title = {Thickness-dependent crystal structure of epitaxial ferroelectric 0.07YO1.5-0.93HfO2 and HZO films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821706, author = {Takanori Kiguchi and Takahisa Shiraishi and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Toyohiko J. Konno}, title = {Nanostructure Analyses of Hafnia-Based Ferroelectric Thin Films by Aberration-Corrected Electron Microscopy}, booktitle = {}, year = 2019, } @inproceedings{CTT100809770, author = {Kodai Aoyama and Takao Shimizu and Hideto Kuramochi and Masami Mesuda and Ryo Akiike and Keisuke Ide and Takayoshi Katase and Toshio Kamiya and Yoshisato Kimura and Hiroshi Funakubo}, title = {Thermoelectric property of MxSr1-xSi2 (M = Ca, Ba) film prepared by co-sputtering method}, booktitle = {}, year = 2019, } @inproceedings{CTT100821306, author = {Miyu Hasegawa and Takao Shimizu and Yusuke Sato and Wakiko Yamaoka and Mirai Ishida and Hiroshi Funakubo}, title = {Piezoelectric Responses in Tetragonal (Bi, Na)TiO3-BaTiO3 Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821430, author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo}, title = {Robust Ferroelectricity in Y-Doped HfO2 Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821431, author = {Akinori Tateyama and Yoshiharu Ito and Yoshiko Nakamura and Takao Shimizu and Yuichiro Orino and Minoru Kurosawa and Hiroshi Uchida and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko Konno and Nobuhiro Kumada and Takeshi Yoshimura and Hiroshi Funakubo}, title = {Characterization of Piezoelectric Coefficient E31, F for {100}-Oriented (K, Na)NbO3 Films Prepared by Hydrothermal Method}, booktitle = {}, year = 2019, } @inproceedings{CTT100821697, author = {A. Katagiri and M. Uehara and T. Shimizu and M. Matsushima and K. Akiyama and H. Uchida and Y. Kimura and H. Funakubo}, title = {Preparation of Mg2Si-based thin films and these properties}, booktitle = {}, year = 2019, } @inproceedings{CTT100821256, author = {Hiroshi Funakubo and Naoya Oshima and Hidehisa Inoue and Yoshitaka Ehara and Takao Shimizu and Hiroshi Uchida}, title = {Enhancement of piezoelectric response in {100}-oriented films using extrinsic contribution}, booktitle = {}, year = 2019, } @inproceedings{CTT100821255, author = {Hiroshi Funakubo and Naoya Ohshima and Hidehisa Inoue and Yoshitaka Ehara and Takao Shimizu and Hiroshi Uchida}, title = {Crystal Structure Change with Applying an Electric Filed in Pb(Zr, Ti)O3 Films for MEMS Applications}, booktitle = {}, year = 2019, } @inproceedings{CTT100821305, author = {Takao Shimizu and Takanori Mimura and Hiroshi funakubo}, title = {Robust ferroelectricity in thick HfO2-based film}, booktitle = {}, year = 2019, } @inproceedings{CTT100821194, author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu}, title = {Property Control of Ferroelectric HfO2 Films}, booktitle = {}, year = 2019, } @inproceedings{CTT100821300, author = {Takanori Kiguchi and Takahisa Shiraishi and Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO and Toyohiko Konno}, title = {STEM-EELS法によるHfO2薄膜の結晶相・配向性の評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100821295, author = {Hidehisa Inoue and Takao Shimizu and HIROSHI FUNAKUBO}, title = {MOCVD法で作製した組成相境界近傍組成PZT膜の電界下X線回折測定}, booktitle = {}, year = 2019, } @inproceedings{CTT100821284, author = {Yoshiharu Ito and Akinori Tateyama and 中村美子 and Takao Shimizu and Minoru Kuribayashi Kurosawa and HIROSHI FUNAKUBO and Hiroshi Uchida and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko Konno and Nobuhiro Kumada}, title = {水熱合成法を用いた(K,Na)NbO3膜の原料の高効率化}, booktitle = {}, year = 2019, } @inproceedings{CTT100821286, author = {Masanori Kodera and Takao Shimizu and HIROSHI FUNAKUBO}, title = {PLD法を用いて作製したBi2SiO5エピタキシャル薄膜の強誘電特性}, booktitle = {}, year = 2019, } @inproceedings{CTT100821193, author = {H. Funakubo and N. Oshima and H. Inoue and Y. Ehara and T. Shimizu and H. Uchida}, title = {Enhancement of Piezoelectric Response in (100) -oriented Films using Extrinsic Contribution}, booktitle = {}, year = 2019, } @inproceedings{CTT100806484, author = {Akinori Tateyama and Yoshiharu Ito and 中村美子 and Takao Shimizu and yuichiro orino and Minoru Kuribayashi Kurosawa and Hiroshi Uchida and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko Konno and Nobuhiro Kumada and Takeshi Yoshimura and HIROSHI FUNAKUBO}, title = {水熱合成法で作製した(K,Na)NbO3配向膜の圧電定数,e31,f, の評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806481, author = {Hidehisa Inoue and Daichi Ichinose and Takao Shimizu and HIROSHI FUNAKUBO}, title = {組成相境界近傍組成を有するPZT膜の電界下X線回折測定}, booktitle = {}, year = 2019, } @inproceedings{CTT100806489, author = {Takanori Kiguchi and Takahisa Shiraishi and Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO and Toyohiko Konno}, title = {直方晶相ハフニア薄膜におけるドメイン構造}, booktitle = {}, year = 2019, } @inproceedings{CTT100806486, author = {Kodai Aoyama and Takao Shimizu and 倉持豪人 and 召田雅実 and 秋池良 and 井出啓介 and 片瀬貴義 and TOSHIO KAMIYA and YOSHISATO KIMURA and HIROSHI FUNAKUBO}, title = {共スパッタ法で作製したBaxSr1-xSi2膜の熱電特性}, booktitle = {}, year = 2019, } @inproceedings{CTT100809793, author = {青山 航大 and 清水 荘雄 and 倉持 豪人 and 召田 雅実 and 秋池 良 and 井手 啓介 and 片瀬 貴義 and 神谷 利夫 and 木村 好里 and 舟窪 浩}, title = {共スパッタ法で作製したBaxSr1-xSi2膜の熱電特性}, booktitle = {}, year = 2019, } @inproceedings{CTT100806494, author = {Masanori Kodera and Takao Shimizu and HIROSHI FUNAKUBO}, title = {水熱合成法を用いたReO3構造を有する酸フッ化物薄膜の作製と誘電特性評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806479, author = {Yuki Tashiro and Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO}, title = {PLD法を用いたY, ZrドープHfO2薄膜の作製と評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806476, author = {Reijiro Shimura and Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO}, title = {スパッタリング法により配向制御したHfO2基強誘電体厚膜の作製およびその電気特性評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806466, author = {Takahisa Shiraishi and Choi Sujin and Takao Shimizu and Takanori Kiguchi and HIROSHI FUNAKUBO and Toyohiko Konno}, title = {強誘電体(Hf,Ce)O2薄膜の作製とその結晶構造評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806460, author = {Hidehisa Inoue and Daichi Ichinose and Takao Shimizu and HIROSHI FUNAKUBO}, title = {組成相境界近傍組成のPZT膜のMOCVD合成とその圧電性評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806461, author = {Yuki Tashiro and Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO}, title = {PLD法を用いたY, ZrドープHfO2薄膜の作製と評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806459, author = {Miyu Hasegawa and Takao Shimizu and 佐藤祐介 and 山岡和希子 and 石田未来 and HIROSHI FUNAKUBO}, title = {正方晶(Bi,Na)TiO3-BaTiO3膜の90°ドメインスイッチングによる圧電特性}, booktitle = {}, year = 2019, } @inproceedings{CTT100806449, author = {Kodai Aoyama and Takao Shimizu and 倉持豪人 and 召田雅実 and 秋池良 and 井出啓介 and Takayoshi Katase and TOSHIO KAMIYA and YOSHISATO KIMURA and HIROSHI FUNAKUBO}, title = {共スパッタ法で作製したBaxSr1-xSi2膜の作製と熱電特性評価}, booktitle = {}, year = 2019, } @inproceedings{CTT100806448, author = {Takao Shimizu and Takanori Mimura and HIROSHI FUNAKUBO}, title = {HfO2基薄膜の相安定性と機能発現}, booktitle = {}, year = 2019, } @inproceedings{CTT100809796, author = {青山航大 and 清水荘雄 and 倉持豪人 and 召田雅実 and 秋池良 and 井手啓介 and 片瀬貴義 and 神谷利夫 and 木村好里 and 舟窪 浩}, title = {共スパッタ法で作製したBaxSr1-xSi2膜の作製と熱電特性評価}, booktitle = {}, year = 2019, } @misc{CTT100836455, author = {Takao Shimizu and HIROSHI FUNAKUBO}, title = {圧電体のドメイン構造変化の時間応答}, year = 2019, } @misc{CTT100836456, author = {Hidehisa Inoue and Takao Shimizu and HIROSHI FUNAKUBO}, title = {圧電体膜における電界印加による結晶構造変化観察}, year = 2019, } @misc{CTT100836458, author = {Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO}, title = {蛍石構造強誘電体薄膜の組成による結晶構造変化の観察}, year = 2019, } @misc{CTT100846538, author = {HIROSHI FUNAKUBO and TakaoShimizu and Kodai Aoyama}, title = {バリウムおよびストロンチウムを含む珪化物薄膜及びその製造方法}, howpublished = {PublishedPatent}, year = 2021, month = {}, note = {特願2019-160314(2019/09/03), 特開2021-038433(2021/03/11)} } @misc{CTT100865142, author = {HIROSHI FUNAKUBO and TakaoShimizu and Miyu Hasegawa and Keisuke Ishihama}, title = {誘電性薄膜、誘電性薄膜素子、圧電アクチュエータ、圧電センサ、ヘッドアセンブリ、ヘッドスタックアセンブリ、ハードディスクドライブ、プリンタヘッド、及びインクジェットプリンタ装置}, howpublished = {PublishedPatent}, year = 2021, month = {}, note = {特願2020-546060(2019/09/11), 再表2020/054779(2021/09/30)} } @misc{CTT100846542, author = {HIROSHI FUNAKUBO and Akinori Tateyama and TakaoShimizu and yuichiro orino and Minoru Kuribayashi Kurosawa and Takahisa Shiraishi}, title = {圧電体膜の製造方法}, howpublished = {PublishedPatent}, year = 2021, month = {Mar.}, note = {特願2019-564746(2019/01/10), 再表2019/139100(2021/03/11)} } @misc{CTT100814172, author = {HIROSHI FUNAKUBO and TakaoShimizu and Kodai Aoyama}, title = {ストロンチウムを含む薄膜及びその製造方法}, howpublished = {RegisteredPatent}, year = 2022, month = {}, note = {特願2018-035001(2018/02/28), 特開2019-149523(2019/09/05), 特許第7076093号(2022/05/19)} } @misc{CTT100808418, author = {HIROSHI FUNAKUBO and TakaoShimizu and Miyu Hasegawa}, title = {圧電薄膜、圧電薄膜素子、圧電アクチュエータ、圧電センサ、ヘッドアセンブリ、ヘッドスタックアセンブリ、ハードディスクドライブ、プリンタヘッド、及びインクジェットプリンタ装置}, howpublished = {PublishedPatent}, year = 2019, month = {}, note = {特願2018-001161(2018/01/09), 特開2019-121702(2019/07/22)} } @misc{CTT100808513, author = {HIROSHI FUNAKUBO and TakaoShimizu and Yuichi Nemoto}, title = {圧電薄膜、圧電薄膜素子、圧電アクチュエータ、圧電センサ、ヘッドアセンブリ、ヘッドスタックアセンブリ、ハードディスクドライブ、プリンタヘッド、及びインクジェットプリンタ装置}, howpublished = {PublishedPatent}, year = 2019, month = {}, note = {特願2017-206190(2017/10/25), 特開2019-079948(2019/05/23)} }