@article{CTT100849036,
  author = {Yoshiomi Hiranaga and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Local C-V mapping for ferroelectrics using scanning nonlinear dielectric microscopy},
  journal = {J. Appl. Phys.},
  year = 2020,
}

@article{CTT100849008,
  author = {Reijiro Shimura and Takanori Mimura and Takao Shimizu and Yoshitomo Tanaka and Yukari Inoue and Hiroshi Funakubo},
  title = {Preparation of near-1-μm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by an RF magnetron sputtering method},
  journal = {J.Ceram. Soc. Jpn},
  year = 2020,
}

@article{CTT100821137,
  author = {Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films},
  journal = {Jpn. J. Appl. Phys.},
  year = 2020,
}

@article{CTT100821136,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Uchida and Hiroshi Funakubo},
  title = {Room-temperature deposition of ferroelectric HfO2-based films by the sputtering metho},
  journal = {Appl. Phys. Lett.},
  year = 2020,
}

@inproceedings{CTT100853321,
  author = {Shimizu Takao and Yoshitaka Ehara and Takanori Mimura and Shintaro Yasui and Tomoaki Yamada and 今井康彦 and Osami Sakata and HIROSHI FUNAKUBO},
  title = {時間分解XRD測定による周期電界下における菱面体PZTの(111)/(-111)ドメイン構造の観察},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100853267,
  author = {Shimizu Takao and Yuki Tashiro and Takanori Mimura and HIROSHI FUNAKUBO},
  title = {HfO2基材料における強誘電相生成機構},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100853255,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Shimizu Takao and HIROSHI FUNAKUBO},
  title = {スパッタリング法によるHfO2基強誘電体厚膜のシリコン基板上への室温製膜とその電気特性および圧電特性評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100852845,
  author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu},
  title = {High stability of Ferroelectric phase in Y-doped HfO2 films},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100852900,
  author = {J. Molina and T. Mimura and Y. Nakamura and T. Shimizu and H. Funakubo and I. Fujiwara and T. Hoshii and S. Ohmi and A. Hori and H. Wakabayashi and K. Tsutsui and K. Kakushima},
  title = {Interface engineering of BEOL compatible ferroelectric Y:HfO2 device for enhanced endurance},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821832,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Takao Shimizu and HIROSHI FUNAKUBO},
  title = {スパッタリング法によるHfO2基強誘電体厚膜の室温製膜とその電気特性評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821828,
  author = {Takanori Mimura and Takao Shimizu and HIROSHI FUNAKUBO},
  title = {エピタキシャルHfO2基膜を用いた直方晶相安定化の調査},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821814,
  author = {Takao Shimizu and Takanori Mimura and HIROSHI FUNAKUBO},
  title = {HfO2基強誘電体の相安定性と厚膜化},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821813,
  author = {Yuki Tashiro and Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko Konno and HIROSHI FUNAKUBO},
  title = {HfO2基薄膜のZr, Yドープによる結晶相変化と強誘電相の安定性},
  booktitle = {},
  year = 2020,
}

@misc{CTT100836447,
  author = {Takanori Mimura and Reijiro Shimura and HIROSHI FUNAKUBO and Takao Shimizu},
  title = {HfO2およびZrO2基強誘電体膜の厚膜化と室温合成},
  year = 2020,
}

@misc{CTT100818059,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  year = 2020,
}

@misc{CTT100818062,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  year = 2020,
}

@misc{CTT100818063,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  year = 2020,
}

@misc{CTT100857770,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  year = 2020,
}

@misc{CTT100869586,
  author = {HIROSHI FUNAKUBO and TakaoShimizu and Takanori Mimura and Yuki Tashiro},
  title = {強誘電性膜の製造方法、強誘電性膜、及びその用途},
  howpublished = {PublishedPatent},
  year = 2020,
  month  = {},
  note   = {PCT/JP2020/018031(2020/04/27), WO 2020/218617(2020/10/29)}
}


@misc{CTT100828285,
  author = {HIROSHI FUNAKUBO and TakaoShimizu and Takanori Mimura},
  title = {強誘電性薄膜、強誘電性薄膜素子、圧電アクチュエータ、圧電センサ、ヘッドアセンブリ、ヘッドスタックアセンブリ、ハードディスクドライブ、プリンタヘッド、及びインクジェットプリンタ装置},
  howpublished = {RegisteredPatent},
  year = 2022,
  month  = {},
  note   = {特願2018-163377(2018/08/31), 特開2020-033629(2020/03/05), 特許第7061752号(2022/04/21)}
}


@misc{CTT100753371,
  author = {TakaoShimizu and HIROSHI FUNAKUBO and Kiriha Katayama and Takanori Mimura},
  title = {強誘電性薄膜、電子素子及び製造方法},
  howpublished = {RegisteredPatent},
  year = 2020,
  month  = {},
  note   = {特願2016-545654(2015/08/28), 再表2016/031986(2017/06/15), 特許第6661197号(2020/02/14)}
}




@phdthesis{CTT100818059,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  school = {Tokyo Institute of Technology},
  year = 2020,
}

@phdthesis{CTT100818062,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  school = {Tokyo Institute of Technology},
  year = 2020,
}

@phdthesis{CTT100818063,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  school = {Tokyo Institute of Technology},
  year = 2020,
}

@phdthesis{CTT100857770,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  school = {Tokyo Institute of Technology},
  year = 2020,
}