@article{CTT100833073,
  author = {Yoshiro Kumagai and Satoshi Fukuyama and Hiroki Tonegawa and Kizashi Mikami and Kodai Hirose and Kanta Tomizawa and Kensuke Ichikawa and Masahiro Watanabe},
  title = {Negative differential resistance of CaF<sub>2</sub>/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process},
  journal = {Japanese Journal of Applied Physics},
  year = 2020,
}

@inproceedings{CTT100833053,
  author = {佐藤 穂波 and 熊谷 佳郎 and 三上 萌 and 利根川 啓希 and 廣瀬 皓大 and 冨澤 勘太 and 金子 拓海 and 渡辺 正裕},
  title = {Si/CaF<sub>2</sub> p型三重障壁共鳴トンネルダイオードの室温微分負性抵抗特性},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100833054,
  author = {金子 拓海 and 熊谷 佳郎 and 廣瀬 皓大 and 利根川啓希 and 三上 萌 and 冨澤 勘太 and 佐藤穂波 and 渡辺正裕},
  title = {CaF<sub>2</sub>/Si/CaF<sub>2</sub>共鳴トンネル量子井戸構造を用いた抵抗スイッチング特性の理論解析},
  booktitle = {},
  year = 2020,
}