@article{CTT100617488,
  author = {Toshifumi YUJI and Takuya URAYAMA and Shuitsu FUJII and Yoshitoki IIJIMA and Yoshifumi SUZAKI and Hiroshi AKATSUKA},
  title = {Basic Characteristics for PEN Film Surface Modification Using Atmospheric-Pressure Nonequilibrium Microwave Plasma Jet},
  journal = {Electronics and Communications in Japan},
  year = 2010,
}

@inproceedings{CTT100615441,
  author = {H. Kataoka and N. Mungkung and T. Yuji and M. Kawano and Y. Kiyota and D. Uesugi and K. Nakabayashi and Y. Suzaki and H. Shibata and N. Kashihara and K. Sakai and T. Bouno and H. Akatsuka},
  title = {Surface modification of silicon wafer by low-pressure high-frequency plasma chemical vapor deposition method},
  booktitle = {2010 24th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)},
  year = 2010,
}

@inproceedings{CTT100600808,
  author = {湯地敏史 and 青木慎二 and 河野唯通 and 赤塚洋},
  title = {大気圧非平衡放電プラズマジェットによる表面処理試料の空間電荷分布測定},
  booktitle = {平成２２年電気学会全国大会講演論文集},
  year = 2010,
}