@article{CTT100802258,
  author = {前田 康貴 and 大見俊一郎 and 後藤 哲也 and 大見 忠弘},
  title = {窒素添加LaB₆薄膜のデバイス応用に関する検討 (シリコン材料・デバイス)},
  journal = {電子情報通信学会技術研究報告 = IEICE technical report : 信学技報},
  year = 2013,
}

@article{CTT100801564,
  author = {Han, H.S. and Han, D.H. and Shun-ichiro OHMI},
  title = {Potential of MISFET with HfN gate dielectric formed by ECR plasma sputtering},
  journal = {Electronics Letters},
  year = 2013,
}