@article{CTT100765856,
  author = {Takumi Ohashi and Iriya Muneta and Kuniyuki Kakushima and Kazuo Tsutsui and Hitoshi Wakabayashi},
  title = {Quantitative relationship between sputter-deposited-MoS2 properties and underlying-SiO2 surface roughness},
  journal = {Applied Physics Express},
  year = 2017,
}

@article{CTT100765852,
  author = {S. Ishihara and Y. Hibino and N. Sawamoto and T. Ohashi and K. Matsuura and H. Machida and M. Ishikawa and H. Sudo and H. Wakabayashi and A. Ogura},
  title = {Effects of Reaction Conditions on MoS2 Thin Film Formation Synthesized by Chemical Vapor Deposition using Organic Precursor},
  journal = {MRS Advances},
  year = 2017,
}

@article{CTT100765851,
  author = {Y. Hibino and S. Ishihara and N. Sawamoto and T. Ohashi and K. Matsuura and H. Machida and M. Ishikawa and H. Sudo and H. Wakabayashi and A. Ogura},
  title = {Investigation on MoS2(1-x)Te2x Mixture Alloy Fabricated by Co-sputtering Deposition},
  journal = {MRS Advances},
  year = 2017,
}

@article{CTT100765848,
  author = {Y. Hibino and S. Ishihara and N. Sawamoto and T. Ohashi and K. Matsuura and H. Machida and H. Wakabayashi and A. Ogura},
  title = {Band gap-tuned MoS2(1-x)Te2x thin films synthesized by a hybrid Co-sputtering and post-deposition tellurization annealing process},
  journal = {Journal of Materials Research},
  year = 2017,
}

@inproceedings{CTT100842525,
  author = {T. Ohashi and R. Takeda and H. Kusu and M. Inoue and H. Tsukagoshi and M. Saijo},
  title = {Entrepreneurial Education for Graduate Students to Nurture New Energy Innovation},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100808048,
  author = {M. Toyama and T. Ohashi and K. Matsuura and J. Shimizu and I. Muneta and K. Kakushima and K. Tsutsui and H. Wakabayashi},
  title = {TiN/Ti Ohmic Contact for Sputtered-MoS2 Film using Forming-Gas Annealing},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100788575,
  author = {N. Hayakawa and I. Muneta and T. Ohashi and K. Matsuura and J. Shimizu and K. Kakushima and K. Tsutsui and H. Wakabayashi},
  title = {Conductance control by tunneling-barrier thickness optimizations in Fe/Al2O3/MoS2 structure},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100780963,
  author = {S. Hirano and J. Shimizu and K. Matsuura and T. Ohashi and I. Muneta and K. Kakushima and K. Tsutsui and H. Wakabayashi},
  title = {Crystallinity improvement using migration-enhancement methods for sputtered-MoS2 films},
  booktitle = {2017 IEEE Electron Device Technology and Manufacturing Conference (EDTM)},
  year = 2017,
}

@inproceedings{CTT100808047,
  author = {岡田 泰典 and 山口 晋平 and 大橋 匠 and 宗田 伊理也 and 角嶋 邦之 and 筒井 一生 and 若林 整},
  title = {Resistivity Reduction of Low-Carrier-Density Sputtered-MoS2 Film using Fluorine Gas},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100780961,
  author = {J. Shimizu and T. Ohashi and K. Matsuura and I. Muneta and K. Kakushima and K. Tsutsui and N. Ikarashi and H. Wakabayashi},
  title = {Low-carrier density sputtered-MoS2 film by H2S annealing for normally-off accumulation-mode FET},
  booktitle = {2017 IEEE Electron Device Technology and Manufacturing Conference (EDTM)},
  year = 2017,
}

@inproceedings{CTT100745515,
  author = {Takumi Ohashi and Makiko Watanabe and Miki Saijo},
  title = {An Interaction Analysis of User-Testing to Extract Salient User Experience with the Robotic Assistive Device Life-Walker},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100903975,
  author = {早川直希 and 宗田伊理也 and 大橋匠 and 松浦賢太朗 and 清水淳一 and 角嶋邦之 and 筒井一生 and 若林整},
  title = {トンネル電極を形成したスパッタ MoS2膜における電流の障壁膜厚依存性},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100903978,
  author = {外山 真矢人 and 大橋 匠 and 松浦 賢太朗 and 清水 淳一 and 宗田 伊理也 and 角嶋 邦之 and 筒井 一生 and 若林 整},
  title = {スパッタリング法で堆積したMoS2薄膜へのコンタクト抵抗と熱処理依存性},
  booktitle = {},
  year = 2017,
}