@article{CTT100881315, author = {Taiga Horiguchi and Takuya Hamada and Masaya Hamada and Iriya Muneta and Kuniyuki Kakushima and Kazuo Tsutsui and Tetsuya Tatsumi and Shigetaka Tomiya and Hitoshi Wakabayashi}, title = {Positive Seebeck coefficient of niobium-doped MoS2 film deposited by sputtering and activated by sulfur vapor annealing}, journal = {Japanese Journal of Applied Physics}, year = 2022, } @article{CTT100875617, author = {Ryo Ono and Shinya Imai and Yuta Kusama and Takuya Hamada and Masaya Hamada and Iriya Muneta and Kuniyuki Kakushima and Kazuo Tsutsui and Emi Kano and Nobuyuki Ikarashi and Hitoshi Wakabayash}, title = {Elucidation of PVD MoS2 Film Formation Process and its Structure Focusing on Sub-Monolayer Region}, journal = {Japanese Journal of Applied Physics (JJAP)}, year = 2022, } @article{CTT100875618, author = {Takuya Hamada and Masaya Hamada and Taiga Horiguchi and Iriya Muneta and Kuniyuki Kakushima and Kazuo Tsutsui and Tetsuya Tatsumi and Shigetaka Tomiya and Hitoshi Wakabayashi}, title = {High Seebeck Coefficient in PVD-WS2 Film with Grain-Size Enlargement}, journal = {Japanese Journal of Applied Physics (JJAP)}, year = 2022, } @inproceedings{CTT100896550, author = {立松 真一 and 濱田 昌也 and 濱田 拓也 and 宗田 伊理也 and 角嶋 邦之 and 筒井 一生 and 若林 整}, title = {アニール処理によるWS2-Niエッジコンタクト特性の向上}, booktitle = {}, year = 2022, } @misc{CTT100866737, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, year = 2022, } @misc{CTT100866724, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, year = 2022, } @misc{CTT100866726, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, year = 2022, } @misc{CTT100894857, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, year = 2022, } @phdthesis{CTT100866737, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, school = {東京工業大学}, year = 2022, } @phdthesis{CTT100866724, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, school = {東京工業大学}, year = 2022, } @phdthesis{CTT100866726, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, school = {東京工業大学}, year = 2022, } @phdthesis{CTT100894857, author = {Masaya Hamada}, title = {2D-Channel FET based on High-Mobility TMDC-Film Formation with PVD Method using Crystal-Quality Improvement Process and Side-Contact Architecture}, school = {東京工業大学}, year = 2022, }