T2R2 Open-Access Full-Text Files Surpass 5,000 Mark!

30 May 2016

  The number of open full-text files has exceeded 5,000!

    The number of T2R2 full-text files accessible to the public exceeded 5,000 on April 20, 2016, and we would like to express our sincere gratitude to all the researchers whose contributions have helped Tokyo Tech to achieve this milestone. The T2R2 system will continue facilitating the dissemination of research being carried out at Tokyo Tech. We appreciate your continuing use of the T2R2 system and your cooperation in data input and file registration.

   Professor Atsushi Takahashi registers the 5,000th file in T2R2!
    The 5,000th paper registered in the T2R2 was published by Professor Atsushi Takahashi, the School of Engineering.

    Title: Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process
    Author: Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka
    Journal: Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3)
    Vol. 15 No. 2 pp. 1-7

    • Please give a summary of your paper.
      In integrated circuit manufacturing, optical lithography equipment transfers a circuit pattern on a wafer by exposure process (lithography), and forms it by etching process. However, it is theoretically impossible to form a circuit pattern whose line pitch is less than about 40 nm by current optical lithography equipment in which the wave length of ArF Excimer Laser used as illumination source is 193 nm. Therefore, various kinds of manufacturing methods are used to form a tiny complex circuit pattern on a wafer. LELECUT, the target of this paper, is one of such manufacturing methods. In LELECUT, litho-etch (LE) process is repeated twice (LELE) to form a pattern and a part of it is removed (CUT) by the third litho-etch process. The pattern treated in each litho-etch process should satisfy the condition for litho-etch, and the effect caused by overlay error among litho-etch processes should be minimized. In this paper, an efficient method obtaining a robust pattern decomposition against overlay error by positive semidefinite relaxation is proposed.

    • Who are the readers being targeted by this publication?
      This paper was published in a journal for advanced VLSI manufacturing technologies. I am very happy if this paper is read by researchers who are interested in algorithm etc. as well as by researchers who are interested in lithography.

    • What research are you planning in the future?
      By analyzing next generation lithography theoretically and practically, we would like to continue with our research on developing a practical design flow that matches next generation lithography.

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  • Access the T2R2 system registration site through Tokyo Tech Portal and click “Register” in the Tool Box located on the left side of the screen, then click “New data entry form” to proceed to the data registration screen.
    • Click “File upload”to register your full-text file, and choose “Wish to disclose”.   
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        ・You may use “New data entry wizard” in the Tool Box.
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