Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Publication Information

Title

Japanese:
English:	Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Author

Japanese:	小平行秀, Chikaaki Kodama, 松井知己, 高橋篤司, Shigeki Nojima, Satoshi Tanaka.
English:	Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka.

Language

English

Journal/Book name

Japanese:
English:	Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3)

Volume, Number, Page

Vol. 15 No. 2 pp. 1-7

Published date

Mar. 2016

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

File

DOI