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Title
Japanese:誘導結合窒素プラズマ中の励起状態数密度と電子温度の関係性に関する議論 
English:Discussion on the Relationship between Number Densities of Excited States and Electron Temperature in Inductively Coupled Nitrogen Plasma 
Author
Japanese: 石健太, 土居謙太, 清田哲司, 山下雄也, 米田和真, 渡邊修平, 島谷和希, 根津篤, 赤塚洋.  
English: Kenta Ishi, Kenta Doi, Tetsuji Kiyota, Yuya Yamashita, Kazuma Yoneda, Shuhei Watanabe, Kazuki Shimatani, Atsushi Nezu, Hiroshi Akatsuka.  
Language Japanese 
Journal/Book name
Japanese:第41回 プラズマプロセシング研究会 プロシーディングス 
English:Proceedings of 41st Symposium on Plasma Processing (SPP-41) 
Volume, Number, Page         pp. 30-31
Published date Jan. 19, 2024 
Publisher
Japanese:応用物理学会プラズマエレクトロニクス分科会 
English:Plasma Electronics Division, Japan Society of Applied Physics 
Conference name
Japanese:第41回プラズマプロセシング研究会 
English:The 41st Symposium on Plasma Processing 
Conference site
Japanese:東京 
English:Tokyo 
Official URL https://gakkai-gran.jp/spp41/
 
Abstract The numerical chemical-kinetic model was updated for inductively coupled nitrogen plasma (nitrogen ICP), and the number densities of N2 excited states were obtained through self-consistent calculations. As a result of these calculations, it was found that electron temperature Te and the number density ratio of N2(C) to N2(B) were positively correlated. This finding can expand the possibility of OES measurement in nitrogen ICP, as Te can be estimated from the number density ratio of N2(C) to N2(B) derived from optical emission spectroscopy (OES) measurement.
Award Plasma Electronics Encouragement Award

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