Microfabrication of Si by KOH Etchant Using Etching Masks Amorphized by Ion Beam Extracted From Electron Cyclotron Plasma

Publication Information

Title

Japanese:
English:	Microfabrication of Si by KOH Etchant Using Etching Masks Amorphized by Ion Beam Extracted From Electron Cyclotron Plasma

Author

Japanese:	佐藤美那, 遠西美重, 松谷晃宏.
English:	Mina Sato, Mie Tohnishi, Akihiro Matsutani.

Language

English

Journal/Book name

Japanese:
English:	Sensors and Materials

Volume, Number, Page

Vol. 36 No. 4 pp. 1319-1328

Published date

Apr. 2024

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: