Submicrometer-sized Patterning of Photoresist  by Electron Beam Projection Lithography  Using Tabletop Scanning Electron Microscope System and Si Stencil Mask

Publication Information

Title

Japanese:
English:	Submicrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscope System and Si Stencil Mask

Author

Japanese:	佐藤美那, 遠西美重, 藤本美穂, 松谷晃宏.
English:	Mina Sato, Mie Tohnishi, Miho Fujimoto, Akihiro Matsutani.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

14P-1-6

Published date

Nov. 2024

Publisher

Japanese:
English:

Conference name

Japanese:
English:	MNC2024 (37th International Microprocesses and Nanotechnology Conference)

Conference site

Japanese:
English: