Microfabrication of Black Ge by SF6/O2- and C4F8-based Deep Reactive Ion Etching

Publication Information

Title

Japanese:
English:	Microfabrication of Black Ge by SF6/O2- and C4F8-based Deep Reactive Ion Etching

Author

Japanese:	遠西美重, 松下祥子, 松谷晃宏.
English:	Mie Tohnishi, Sachiko Matsushita, Akihiro Matsutani.

Language

English

Journal/Book name

Japanese:
English:	Sensors and Materials

Volume, Number, Page

Vol. 37 No. 3 pp. 943-953

Published date

Mar. 2025

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: