Sub-micrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscopy System and Stencil Masks

Publication Information

Title

Japanese:
English:	Sub-micrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscopy System and Stencil Masks

Author

Japanese:	佐藤美那, 遠西美重, 藤本美穂, 松谷晃宏.
English:	Mina Sato, Mie Tohnishi, Miho Fujimoto, Akihiro Matsutani.

Language

English

Journal/Book name

Japanese:	Sensors and Materials
English:

Volume, Number, Page

Vol. 37 No. 3 pp. 977-985

Published date

Mar. 2025

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: