SF6/CO2-based Deep Reactive Ion Etching of Si

Publication Information

Title

Japanese:
English:	SF6/CO2-based Deep Reactive Ion Etching of Si

Author

Japanese:	松谷晃宏, 佐藤美那, 藤本美穂, 遠西美重.
English:	Akihiro Matsutani, Mina Sato, Miho Fujimoto, Mie Tohnishi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

19P-1-92L

Published date

Nov. 2025

Publisher

Japanese:
English:

Conference name

Japanese:
English:	38th International Microprocesses and nanotechnology Conference (MNC2025)

Conference site

Japanese:
English: