CO2/SF6-based Deep Reactive Ion Etching of Si

Publication Information

Title

Japanese:
English:	CO2/SF6-based Deep Reactive Ion Etching of Si

Author

Japanese:	松谷晃宏, 佐藤美那, 藤本美穂, 遠西美重.
English:	Akihiro Matsutani, Mina Sato, Miho Fujimoto, Mie Tohnishi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Vol. 38 No. 3 pp. 1193-1205

Published date

Mar. 2026

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL

DOI