論文

• T. Akushichi, Y. Takamura, Y. Shiotsu, S. Yamamoto, S. Sugahara. Spin Injection Behavior of CoFe/MgO/Si Tunnel Contacts: Effects of Radical Oxygen Annealing, J. Electron. Mater., vol. 52, pp. 6902-6910, Aug. 2023.
• T. Akushichi, Y. Takamura, Y. Shuto, S. Sugahara. Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with high quality tunnel barriers prepared by radical-oxygen annealing, J. Appl. Phys., AIP Publishing LLC, Vol. 117, No. 17, pp. 17B531/1-4, May 2015.
• Y. Takamura, T. Akushichi, Y. Shuto, S. Sugahara. Analysis and design of nonlocal spin devices with electric-field-induced spin-transport acceleration, J. Appl. Phys., AIP Publishing LLC, Vol. 117, No. 17, pp. 17D919/1-4, Apr. 2015.
• Y. Kawame, T. Akushichi, Y. Takamura, Y. Shuto, S. Sugahara. Fabrication and characterization of spin injector using a high-quality B2-ordered-Co2FeSi0.5Al0.5/MgO/Si(100) tunnel contact, J. Appl. Phys., AIP Publishing LLC, Vol. 117, No. 17, pp. 17D151/1-3, Apr. 2015.
• Y. Takamura, T. Akushichi, A. Sadono, T. Okishio, Y. Shuto, S. Sugahara. Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices, J. Appl. Phys., AIP Publishing LLC., vol. 115, no. 17, pp. 17C307/1-3, Apr. 2014.

国際会議発表 (査読有り)

• T. Akushichi, D. Kitagata, Y. Shuto, S. Sugahara. Analysis of Spin Accumulation in a Si Channel Using CoFe/MgO/Si Spin Injectors, Electron Device Technology and Manufacturing Conference, P-15, Feb. 2017.
• D. Kitagata, T. Akushichi, Y. Takamura, Y. Shuto, S. Sugahara. Robust Design of Electric-field-assisted Nonlocal Si-MOS Spin-devices, 2016 IEEE Silicon Nanoelectronics Workshop (SNW 2016), P2-23, pp. 200-201, June 2016.
• T. Akushichi, D. Kitagata, Y. Takamura, Y. Shuto, S. Sugahara. Spin Accumulation in a Si Channel using High-Quality CoFe/MgO/Si Spin Injectors, 2016 IEEE Silicon Nanoelectronics Workshop (SNW 2016), P1-27, June 2016.
• D. Kitagata, T. Akushichi, Y. Takamura, Y. Shuto, S. Sugahara. Design and analysis of electric-field-assisted nonlocal silicon-channel spin devices, 2015 IEEE Silicon Nanoelectronics Workshop (SNW2015), June 2015.  公式リンク  
  
• Y. Takamura, T. Akushichi, Y. Shuto, S. Sugahara. Analysis and design of nonlocal spin devices with bias-induced spin-transport acceleration, 59th Annual Magnetism & Magnetic Materials Conference, GS-07, Nov. 2014.
• Y. Kawame, Y. Shuto, K. Takahashi, T. Akushichi, Y. Takamura, S. Sugahara. Fabrication of a CoFe/TiO2/Si tunnel contact and its spin-injector application, 59th Annual Magnetism & Magnetic Materials Conference, FW-15, Nov. 2014.
• Y. Kawame, T. Akushichi, Y. Shuto, Y. Takamura, S. Sugahara. Fabrication and characterization of spin injector using a high-quality B2-ordered-Co2FeSi0.5Al0.5 /MgO/Si tunnel contact, 59th Annual Magnetism & Magnetic Materials Conference, AH-09, Nov. 2014.
• T. Akushichi, Y. Takamura, Y. Shuto, S. Sugahara. Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with the high quality tunnel barriers prepared by radical-oxygen annealing, 59th Annual Magnetism & Magnetic Materials Conference, FW-11, Nov. 2014.
• Y. Takamura, A. Sadono, T. Akushichi, T. Okishio, Y. Shuto, S. Sugahara. Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices, The 58th Annual Magnetism and Magnetic Materials (MMM) Conference, AX-05, Nov. 2013.

国内会議発表 (査読なし・不明)

• 清野稔仁, 悪七泰樹, 菅原聡. CoFe/HfO2/Siスピン注入源の作製と評価, 第64回応用物理学会春季学術講演会, 16a-501-11, Mar. 2017.
• 北形大樹, 悪七泰樹, 菅原聡. 電界アシスト4端子非局所MOSデバイスの解析と設計, 第21回スピン工学の基礎と応用 (PASPS-21), E-3, Dec. 2016.
• 清野稔仁, 悪七泰樹, 菅原聡. CoFe/Hf系酸化物/Siスピン注入源の作製と評価, 第21回スピン工学の基礎と応用 (PASPS-21), P-12, Dec. 2016.
• 周藤悠介, 高橋克典, 悪七泰樹, 髙村陽太, 菅原聡. CoFe/TIO2/Siスピン注入源の作製と評価, 第 19 回半導体スピン工学の基礎と応用 PASPS-19, P-18, Dec. 2014.
• 悪七泰樹, 髙村陽太, 周藤悠介, 菅原聡. 高品質CoFe/MgO/SiおよびCoFe/AlOx/Siトンネルコンタクトを用いた Siチャネルへのスピン注入, 第 19 回半導体スピン工学の基礎と応用 PASPS-19, O-5, Dec. 2014.
• 髙村陽太, 悪七泰樹, 周藤悠介, 菅原聡. 電界誘起によるスピン伝導の加速を用いた非局所スピンデバイス, 第 19 回半導体スピン工学の基礎と応用 PASPS-19, O-6, Dec. 2014.
• 悪七泰樹, 髙村陽太, 周藤悠介, 菅原聡. スピン蓄積デバイスにおける Hanle 効果の解析, 第 19 回半導体スピン工学の基礎と応用 PASPS-19, P-19, Dec. 2014.
• 川目悠, 悪七泰樹, 髙村陽太, 周藤悠介, 菅原聡. (100)配向したCo2FeSi0.5Al0.5/MgO/Siトンネル接合の作製とそのスピン注入源応用, 第 19 回半導体スピン工学の基礎と応用 PASPS-19, P-20, Dec. 2014.
• 高村陽太, 悪七泰樹, 周藤悠介, 菅原聡. 3端子スピン蓄積デバイスにおけるHanle効果信号の解析, 第38回 日本磁気学会学術講演会, 第38回 日本磁気学会学術講演会, 4aD-1, Sept. 2014.
• 高橋克典, 悪七泰樹, 周藤悠介, 高村陽太, 菅原聡. CoFe/TiO2/Siトンネルコンタクトの作製とそのスピン注入源への応用, 第38回 日本磁気学会学術講演会, 4aD-4, Sept. 2014.
• 川目悠, 悪七泰樹, 周藤悠介, 高村陽太, 菅原聡. B2型Co2FeSi0.5Al0.5/MgO/Siスピン注入源の作製と評価, 第38回 日本磁気学会学術講演会, 4aD-3, Sept. 2014.
• 悪七泰樹, 高村陽太, 周藤悠介, 菅原聡. ラジカル酸素アニールによる高品質トンネル障壁を有するCoFe/MgO/SiおよびCoFe/AlOx/Siコンタクトを用いたスピン蓄積の評価, 第38回 日本磁気学会学術講演会, 4aD-2, Sept. 2014.
• Y. Takamura, A. Sadono, T. Akushichi, T. Okishio, Y. Shuto, S. Sugahara. Analysis of Hanle-effect signals observed in a Si-channel spin accumulation device with a high-quality CoFe/MgO/Si spin injector, The 61st JSAP Spring Meeting, 2014, Mar. 2014.

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