論文

• KAZUO TSUTSUI, Ruifei Xiang, K. Nagahiro, T. Shiozawa, Ahmet Parhat, Y. Okuno, M. Matsumoto, M. Kubota, Kuniyuki KAKUSHIMA, HIROSHI IWAI. Analysis of irregular increase in sheet resistance of Ni silicides on transition from NiSi to NiSi2, Microelectronic Engineering, Vol. 85, pp. 315-319, 2008.

国際会議発表 (査読有り)

• Youichi Kobayashi, Ruifei Xiang, Kazuo Tsutsui, Hiroshi Iwai. Formation of heat resistant Ni silicide by additional Hf layers, Materials for Advanced Metallization (MAM2005), Mar. 2005.

[ BibTeX 形式で保存 ]    [ 論文・著書をCSV形式で保存 ]    [ 特許をCSV形式で保存 ]