論文

• A. Matsutani, K. Nishioka, M. Sato, D. Shoji, D. Kobayashi, T. Isobe, A. Nakajima, T. Tatsuma, S. Matsushita. Angled Etching of (001) Rutile Nb-TiO2 Substrate by SF6 Based Capacitive Coupled Plasma, Vol. 53, pp. 06JF02, 2014.

国際会議発表 (査読有り)

• Kenji Ohmori, W. Feng, Soshi Sato, R. Hettiarachchi, M. Sato, T. Matsuki, Kuniyuki KAKUSHIMA, HIROSHI IWAI, Keisaku Yamada. Direct Real-Time Observation of Channel Potential Fluctuation, Correlated to Random Telegraph Noise of Drain Current Using Nanowire MOSFETs with Four-Probe Terminals, 2011 Symposium on VLSI Technology, 2011.

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