論文

• Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi. Source-position-dependent transmission cross coefficient formula including polarization and mask three-dimensional effects in high-numerical-aperture extreme ultraviolet lithography, Journal of Micro/Nanopatterning, Materials and Metrology (JM3), SPIE, Vol. 25, issue 3, May 2026.

国際会議発表 (査読有り)

• Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi. STCC formula including polarization and M3D effects in high-NA EUV lithography, Optical and EUV Nanolithography XXXIX, Proc. SPIE, SPIE, Vol. 13979, Feb. 2026.
• Moe Sugiyama, Masayuki Shimoda, Hiroyoshi Tanabe, Atsushi Takahashi. EUV M3D parameter prediction of curvilinear mask patterns by convolutional neural networks, DTCO and Computational Patterning V, Proc. SPIE, SPIE, Vol. 13980, pp. 139801J-1-6, Feb. 2026.
• Atsushi Takahashi, Moe Sugiyama, Masayuki Shimoda, Hiroyoshi Tanabe. Mask 3D Parameter Prediction in EUV Lithography by Convolutional Neural Network, IEEE Asia Pacific Conference on Circuits and Systems (APCCAS), IEEE, Oct. 2025.

国内会議発表 (査読有り)

• 杉山萌, 田邊容由, 下田将之, 高橋篤司. EUVリソグラフィシミュレーション高速化のための CNN学習用カーブリニアマスクパターン生成, DAシンポジウム2025 論文集, 一般社団法人 情報処理学会, pp. 106-112, Aug. 2025.  公式リンク  
  

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