論文

• Pankaj Attri, Kenji Ishikawa, Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, DaeYeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, Masaharu Shiratani. Developments in low-temperature plasma applications in Asia, Reviews of Modern Plasma Physics, Vol. 9, 6 (pp.72), Jan. 2025.

国際会議発表 (査読なし・不明)

• Nozomi Takeuchi, Siqi Deng, Manabu Kodama, Katsuyuki Takahashi, Kosuke Tachibana, Junko Hieda, Oi Lun Li. Development of Carbon Sulfonation Process Using Plasma in Contact with Liquid, The International Sympojium on Biomimetic Materials Pocessing 2025, Jan. 2025.

国内会議発表 (査読なし・不明)

• YAO Kaixun, 高橋克幸, 立花孝介, 兒玉学, LI Oi Lun, 竹内希. Comparison of Sulfonation Efficiency of Plasma Treatments between Dielectric Barrier Discharge and DC Discharge, 誘電・絶縁材料/放電・プラズマ・パルスパワー/高電圧 合同研究会, Jan. 2025.

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