論文

• Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi. Source-position-dependent transmission cross coefficient formula including polarization and mask three-dimensional effects in high-numerical-aperture extreme ultraviolet lithography, Journal of Micro/Nanopatterning, Materials and Metrology (JM3), SPIE, Vol. 25, issue 3, May 2026.

国際会議発表 (査読有り)

• Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi. STCC formula including polarization and M3D effects in high-NA EUV lithography, Optical and EUV Nanolithography XXXIX, Proc. SPIE, SPIE, Vol. 13979, Feb. 2026.
• Moe Sugiyama, Masayuki Shimoda, Hiroyoshi Tanabe, Atsushi Takahashi. EUV M3D parameter prediction of curvilinear mask patterns by convolutional neural networks, DTCO and Computational Patterning V, Proc. SPIE, SPIE, Vol. 13980, pp. 139801J-1-6, Feb. 2026.

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