Tokyo Tech Research Repository (T2R2)

Patent Information

Title

高解像度パターン転写方法

Author

Kind

Patent

Status

Registered

Applicant

国立大学法人東京工業大学.

Filing Date

2005/10/14

Application Number

特願2006-543078

Unexamined Application Date

2008/05/22

Publication Number

再表2006/046475

Registration Date

2007/05/11

Registration Number

特許第3950981号

©2007 Tokyo Institute of Technology All rights reserved.