Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:	HfNのECR Ar/O₂プラズマ酸化によるHfO_xN_y薄膜の形成
English:

Author

Japanese:	黒瀬朋紀, 内川偉史, 大見俊一郎, 酒井徹志.
English:	黒瀬朋紀, 内川偉史, 大見俊一郎, 酒井徹志.

Language

Japanese

Journal/Book name

Japanese:	第65回応用物理学会学術講演会
English:

Volume, Number, Page

Vol. 2 pp. 679

Published date

2004

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

©2007 Tokyo Institute of Technology All rights reserved.