Mechanism of Thermal Oxidation of Silicon Substrates | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:	シリコン基板の熱酸化機構
English:	Mechanism of Thermal Oxidation of Silicon Substrates

Author

Japanese:	須佐匡裕, 永田和宏, 後藤和弘.
English:	Masahiro Susa, 永田和宏, 後藤和弘.

Language

English

Journal/Book name

Japanese:	日本金属学会誌
English:	Journal of the Japan Institute of Metals

Volume, Number, Page

Vol. 54 No. 1 pp. 33

Published date

1990

Publisher

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English:

Conference name

Japanese:
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Conference site

Japanese:
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