Thermal Oxidation of Silicon Substrates through Oxygen Diffusion | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Thermal Oxidation of Silicon Substrates through Oxygen Diffusion

Author

Japanese:	須佐匡裕, K Nagata.
English:	M Susa, K Nagata.

Language

English

Journal/Book name

Japanese:
English:	Materials Science and Engineering

Volume, Number, Page

Vol. A146 No. 1-2 pp. 51

Published date

1991

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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