B doping using B2H6 in gas source Si molecular beam epitaxy | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	B doping using B2H6 in gas source Si molecular beam epitaxy

Author

Japanese:	平山博之.
English:	HIROYUKI HIRAYAMA.

Language

English

Journal/Book name

Japanese:
English:	Applied Physics Letters

Volume, Number, Page

Vol. 58 pp. 1991-1993

Published date

1991

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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