Structural properties of polycrystalline silicon films having varied textures fabricated with intentional control of surface reactions using SiF4/H2/SiH4 mixing gas
Author
Japanese:
T. Kamiya,
K. Nakahata,
C.M. Fortmann,
I. Shimizu.
English:
T. Kamiya,
K. Nakahata,
C.M. Fortmann,
I. Shimizu.